Dainippon Screen Mfg. Co., Ltd.

Hideyuki Teraoka

Takatoshi Chiba

A temperature control signal (S.sub.1) responsive to a target temperature is biquadrated (S.sub.1.sup.4) to produce a power control signal. A power supply unit supplies electric power to one or more radiant heat sources on the basis of the power control signal, whereby an object such as, for example, a wafer is heated by radiant energy from the one or more radiant heat sources. The wafer temperature is proportional to the biquadrative root of the radiant energy in accordance with the well-known Stefan-Boltzmann's law, whereby the wafer temperature correctly follows a predetermined time-dependent target temperature variation over time.

Method and apparatus for controlling the temperature of a radiantly

A heat treatment method in which a heating furnace is preliminarily heated before carrying an object to be heat-treated in the furnace and an unit heating process is repeated at least twice according to an output program for controlling an output of a heating light source which is stored in a memory so that the heat treatment is uniformly applied to every object to be heat treated.

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Hikone, Japan

Hideyuki Teraoka