Keyence Corporation

Sharp Kabushiki Kaisha Corporation

Shibaura Mechatronics Corporation

V Technology Co., Ltd.

Hideyuki Suzuki

Masatoshi Nakayama

Makoto Kanbe

Takahiro Yamazaki

Shigeki Tanaka

Toshinari Arai

Yuji Yoshida

Takaaki Ito

Keita Katayose

Ryohei Suzaki

Satoru Hara

Akihiro Shigeyama

Mineyuki Matsumoto

Tadashi Shiozaki

A scanning exposure device includes a stage that supports a substrate, wherein a space is provided between a stage surface and the substrate; a light source unit that radiates light to a light irradiation area that extends in one direction above the substrate; and a scanning device that moves one or both of the stage and the light source unit relatively in a scanning direction that intersects the one direction. The scanning device is provided with an acceleration zone from a position in which the stage and the light source unit are at a standstill to a position in which the substrate supported by the stage enters the light irradiation area. The stage comprises a light shielding member that covers the space between the stage surface and the substrate at an end part of the stage.

Scanning exposure device

The present invention aims to provide a supporting material for supporting the shape of a photofabrication model on photofabrication in ink-jet three dimensional printing method in which the photocured product is excellent in solubility in water and is easy to remove after photofabrication, and the like. A modeling material for forming a photofabrication model in ink-jet three dimensional printing method containing a curable resin component with a weighted average of SP value of 9.0 to 10.3; and a supporting material for supporting the shape of a photofabrication model on photofabrication in ink-jet three dimensional printing method containing a water-soluble monofunctional ethylenically unsaturated monomer (F), polyoxypropylene glycol with a number average molecular weight of 100 to 5,000 and/or water (G), and a photopolymerization initiator (D).

Modeling material for forming photofabrication model in ink-jet three dimensional printing, supporting material for supporting the shape of photofabrication model on photofabrication and production method of photofabrication model

A droplet applying device () includes: application heads () configured to eject an application liquid as multiple droplets toward to-be-coated subjects (K, K); a moving mechanism () configured to move each of the to-be-coated subjects (K, K) and the application heads () relative to each other; and a rotating mechanism () configured to rotate the to-be-coated subjects (K, K) in a plane intersecting with an ejecting direction in which the multiple droplets are ejected.

Droplet applying device, droplet applying method, liquid crystal display panel manufacturing apparatus, and liquid crystal display panel manufacturing method

It is an object to enable control according to an optimum temperature condition for a wavelength conversion device. There are provided a laser medium for creating fundamental-wave laser light with a fundamental frequency; a wavelength conversion device which, if the fundamental-wave laser light from the laser medium is inputted thereto, creates higher-harmonic-wave laser light with a harmonic wavelength of a higher order than the wavelength of the fundamental-wave laser light; a temperature measurement section for measuring the temperature of the wavelength conversion device; a temperature adjustment section for adjusting the temperature of the wavelength conversion device; a temperature control section for controlling the temperature adjustment section for changing the temperature of the wavelength conversion device within a predetermined range; an output monitoring section for measuring the laser power emitted from the wavelength conversion device at each temperature of the wavelength conversion device which is changed in temperature by the temperature control section; and a temperature setting section for setting the temperature of the wavelength conversion device at which the laser power measured by the output monitoring section has a maximum value, as an optimum temperature of the wavelength conversion device.

Laser processing apparatus, method for making settings for the laser processing apparatus, program for making settings for the laser processing apparatus, and computer-readable recording medium

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Osaka, Japan

Hideyuki Suzuki