Dai Nippon Printing Co., Ltd.

Hideyuki Nara

Kiyoshi Yamazaki

Yuji Machiya

Hajime Seino

Kouji Ishida

Syogo Narukawa

Tatsuya Tomita

A photomask with a dummy pattern is inspected in a predetermined detection sensitivity by using photomask pattern data designating a photomask with a dummy pattern to detect defects in the photomask. Coordinates indicating the positions of the defects are also determined. The defects in a design pattern area and those in a dummy pattern area are discriminated by using defect-discriminating data. The defects in the design pattern area and those in the dummy pattern area are examined on the basis of respective inspection specifications.

Photomask inspecting method

Substrate-selecting equipment selects substrates used for objective products from among a group of substrates with photosensitive material layers used for the production of photomask. The substrate-selecting equipment comprises one or more of the defect-registering part(s) for registering the results of the inspection of defects of substrates with photosensitive material layers in database, the photosensitive material layer lot check result-registering part for registering the results of check of lots of photosensitive material layers in database and the substrate-selecting part for selecting substrates used for the production of objective products from among a group of substrates with photosensitive material layers, on the basis of the results of inspection of defects and the results of check of lots of photosensitive materials registered in database.

Substrate selector

Growing community of inventors

Shinjuku-ku, Japan

Hideyuki Nara