Nec Corporation

Hideyuki Moribe

Ryuji Hasegawa

Takahiro Igeta

Yoshikazu Katou

Yukio Morishige

Yukio Ogura

Kenichi Matsumura

Masaki Tsunekane

Katsuji Mukaihara

Takeshi Bashomatsu

Shuetsu Kudo

Motonari Tateno

Takashi Ooyama

A method for forming an image of an object includes: illuminating sequentially a surface of the object arranged in the same shooting area using each of N (N is natural number equal to or more than two) polarized light beams, each of which has different property; scanning the surface using the each of N polarized light beams; and outputting the each of N polarized light beams reflected by the surface, the each of N polarized light beams passed-through the object or the each of N polarized light beams scattered by the surface, as an image signal.

Defect inspection method of fine structure object and defect inspection apparatus

A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.

Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same

An inspected object (e.g., a reticle) is stored in an immersion cassette filled with a liquid having a specific refraction factor. An inspection beam is irradiated toward the inspected object, which is subjected to precise positioning, via an objective lens while being refracted by the liquid, thus producing a reflected inspection beam reflected by the inspected object and a transmitted inspection beam transmitted through the inspected object. Image processing is performed based on at least one of the reflected inspection beam and the transmitted inspection beam, thus producing an inspected image of the inspected object. The inspected image is compared with a prescribed circuit pattern so as to inspect the existence and nonexistence of foreign matter or structural defects on the exterior of the inspected object. Thus, it is possible to secure an adequate focal depth of the objective lens while achieving a high resolution in imaging the inspected object.

Optical exterior inspection apparatus and method

An apparatus for inspecting a fine pattern with a simple configuration is provided. The apparatus mainly comprises a scanning unit for scanning a surface of the pattern using a light spot, a reflection detecting unit for detecting one of the light beams having been separated from a light beam reflected at the pattern and outputting a first light intensity signal, an astigmatism detecting unit for creating a second light intensity signal including a phase information on the other light beam having been separated, and an image processing unit for creating an inspection result of the pattern based on the first and second light intensity signals.

Method and apparatus for inspecting a pattern

An optical inspection apparatus for inspecting an inspection target surface by irradiating the inspection target surface with light, includes: a condensing and scanning optical system for condensing light from a light source on the inspection target surface in a minute spot shape and scanning the condensed minute-spot-shaped light onto the inspection target surface; and a phase change information detection apparatus for detecting optical phase change information in an area of the inspection target surface irradiated with the minute-spot-shaped light scanned by the condensing and scanning optical system.

Optical inspection apparatus and optical inspection method

The present focusing method is used in a focus detecting apparatus comprising an objective lens, means for entering a luminous flux for focus detection into a target object from a position inconsistent with an optical axis of the objective lens through at least the objective lens, a condenser lens for converging the luminous flux after it is reflected by the target object and again passes through the objective lens, two two-division sensors disposed with the same optical inclination in front of and behind a position where the reflected luminous flux is converged by the condenser lens when a focus of the objective lens is adjusted to the surface of the target object, and a signal processing circuit for performing operational processing of signals from the two two-division sensors. The focus detecting apparatus detects whether the focus of the objective lens is adjusted to the surface of the target object. When focusing is performed with this apparatus, the target object is moved while the focus position is followed after the detection of the focus position, focus detection is performed many times and the detected signal values are averaged, and the resultant average value is used to drive the objective lens. This series of operations is repeated, and then the focus position is fixed.

Focusing method

A diode-laser side-pumped solid-state laser device (SSLD) has a cylindrical laser rod, a cooling tube, and a cylindrical mirror member having an inner mirror surface and a plurality of openings therein for introducing pumping laser. The laser rod receives the pumping laser, absorbs a portion of the pumping laser, and passes and focus the remaining portion of the pumping laser at a focal point disposed on the mirror surface. Substantially all the remaining portion of the pumping laser is reflected to be received and absorbed by the laser rod.

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Tokyo, Japan

Hideyuki Moribe