Hitachi-high-technologies Corporation

Hitachi, Ltd.

Hitachi High-tech Corporation

Hideyuki Kazumi

Toshiyuki Yokosuka

Akira Ikegami

Ken Yoshioka

Hajime Kawano

Minoru Yamazaki

Hideto Dohi

Chahn Lee

Manabu Edamura

Kenji Maeda

Tsutomu Tetsuka

Tsunehiko Tsubone

Masatsugu Arai

Tatsumi Mizutani

Takafumi Tokunaga

Yuzuru Mizuhara

Akira Doi

Zhaohui Cheng

Kazutami Tago

Hiroyuki Takahashi

Ryoji Nishio

Natsuki Tsuno

Saburo Kanai

Daisuke Bizen

Shahedul Hoque

Kumiko Shimizu

Yoshinobu Kimura

Motohiko Yoshigai

Sadayuki Okudaira

Miki Isawa

Koichiro Takeuchi

Yasunari Sohda

Masaru Izawa

Hiroshi Makino

Tokuo Kure

Tetsuo Ono

Naomasa Suzuki

Masayuki Kojima

Yasushi Goto

Takashi Sato

Momoyo Enyama

Naoyuki Kofuji

Makoto Sakakibara

Takafumi Miwa

Osamu Nasu

Kouichi Kurosawa

Manabu Yano

Yasuhiro Nishimori

Makoto Suzuki

Koichi Hamada

Hitoshi Tamura

Hironobu Kawahara

Hisaya Murakoshi

Saburou Kanai

Takeyoshi Ohashi

Michio Hatano

Yoshinori Momonoi

Atsushi Kobaru

Kazunari Asao

Masamichi Sakaguchi

Kotoko Urano

Akihiro Sano

Shingo Hayashi

Takeshi Mizuno

Kaori Shirahata

Yuki Ojima

Seiko Oomori

Yuji Takagi

Muneyuki Fukuda

Chie Shishido

Yoichi Ose

Atsushi Miyamoto

Yasutaka Toyoda

Masahito Mori

Hiroya Ohta

Yuko Sasaki

Hideo Kashima

Naoshi Itabashi

Noriaki Arai

Akitaka Makino

Kazuyuki Ikenaga

Tomonori Nakano

Yusuke Abe

Manabu Hasegawa

Kenji Nakahira

Shoji Hotta

Sayaka Tanimoto

Mayuka Osaki

Yuta Kawamoto

Atsushi Ootake

Ichiro Sasaki

Hirohiko Kitsuki

Yutaka Tandai

Yuzuru Mochizuki

Tsuyoshi Yoshida

Kenji Yasui

Eiji Ikegami

Seiko Omori

Toshiaki Nishida

Junichiro Tomizawa

A training method that performs learning using appropriate low-quality image and high-quality image is provided. The invention is directed to a training method including executing learning by inputting a first image generated under a first image generation condition and a second image generated under a second image generation condition different from the first image generation condition to a learning apparatus that adjusts parameters so as to suppress an error between an input image and a converted image, in which the second image is selected such that an index value extracted from the second image is the same as or has a predetermined relationship with an index value extracted from the first image, or the second image is output from a second image generation tool different from a first image generation tool for generating the first image.

Training method for learning apparatus, and image generation system

The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG.A).

Charged particle beam device, and method for controlling charged particle beam device

A charged particle optical system includes an aberration correctorthat corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detectorby irradiating a sample with the charged particle beam before and after the first multipole field is generated.

Charged particle beam device and aberration correction method

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

Charged particle beam device

Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipolecomprises: a plurality of poles Q-Qthat are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P-Pthat are arranged between the plurality of poles Q-Qand are made of an insulator. The poles Q-Qand the braces P-Pare joined by fitting the braces P-Pinto the cutouts N and applying brazing so as to be interposed by a bonding material.

Multistage-connected multipole, multistage multipole unit, and charged particle beam device

The objective of the present invention is to use brightness images acquired under different energy conditions to estimate the size of a defect in the depth direction in a simple manner. A charged-particle beam device according to the present invention determines the brightness ratio for each irradiation position on a brightness image while changing parameters varying the signal amount, estimates the position of the defect in the depth direction on the basis of the parameters at which the brightness ratio is at a minimum, and estimates the size of the defect in the depth direction on the basis of the magnitude of the brightness ratio (see FIG.).

Charged-particle beam device and cross-sectional shape estimation program

The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.

Pattern cross-sectional shape estimation system and program

The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG.).

Charged particle ray device and cross-sectional shape estimation program

Provided is a scanning electron microscope. The scanning electron microscope is capable of removing a charge generated on a side wall of a deep hole or groove, and inspects and measures a bottom portion of the deep hole or groove with high accuracy. Therefore, in the scanning electron microscope that includes an electron sourcethat emits a primary electron, a sample stageon which a sample is placed, a deflectorthat causes the sample to be scanned with the primary electron, an objective lensthat focuses the primary electron on the sample, and a detectorthat detects a secondary electron generated by irradiating the sample with the primary electron, a potential applied to the sample stage is controlled to have a negative polarity with respect to a potential applied to the objective lens during a first period in which the sample is irradiated with the primary electron, and the potential applied to the sample stage is controlled to have a positive polarity with respect to the potential applied to the objective lens during a second period in which the sample is not irradiated with the primary electron.

Scanning electron microscope and sample observation method using scanning electron microscope

A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculated correction amount.

Charged particle beam device and aberration correction method for charged particle beam device

The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.

In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device () which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (), and a feedback determination device () which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.

Aberration correction method, aberration correction system, and charged particle beam apparatus

Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.

Growing community of inventors

Tokyo, Japan

Hideyuki Kazumi