Mitsubishi Materials Corporation

Asahi Glass Company, Limited

Asahi Glass Company, Limted

Hideyuki Hirakoso

Katsumi Ogi

Keisuke Abe

Yasuhiro Sanada

Shingo Okamura

Masayuki Ishikawa

Nobuyuki Soyama

Hiroto Uchida

Yoshinori Takayama

Kentarou Tsunozaki

Akio Yanagisawa

To provide an ink composition capable of forming a metallic material which is excellent in adhesion to a substrate and free from ion migration. An ink composition having fine metallic copper particles and/or fine copper hydride particles, and fine silver oxide particles or fine metallic silver particles, dispersed in a water-insoluble organic liquid, which composition has a solid content concentration of from 10 to 80 mass % and contains from 5 to 90 parts by mass of the fine metallic copper particles and/or fine copper hydride particles, and from 10 to 95 parts by mass of the fine silver oxide particles or fine metallic silver particles, per 100 parts by mass of the total solid content in the ink composition.

Ink composition and metallic material

It is to provide fine particles of copper, nickel or palladium hydride having an average particle diameter of at most 50 nm, which are hardly oxidized in the atmosphere and are excellent in storage stability and are thereby very suitable for formation of metallic materials, and their production process. Further, it is to provide a dispersion containing fine particles of copper, nickel or palladium hydride, which is excellent in storage stability, and a metallic material obtained by applying the dispersion, followed by baking. The fine particles of copper, nickel or palladium hydride and the dispersion thereof, to be obtained by the present invention, are applicable to various applications, and they can be used for e.g. formation and repair of printed wiring, etc. employing a dispersion, interlayer wiring in semiconductor packages, and joining of printed wiring boards and electronic components.

Fine metal hydride particles, their production process, dispersion containing fine metal hydride particles and metallic material

To provide metal-containing fine particles having good dispersion stability, which have their surface coated with dispersants vaporizable even during firing at low temperatures, a fine particle dispersion having the above metal-containing fine particles dispersed therein, and an electroconductive metal-containing material having an excellent volume resistivity formed by using the fine particle dispersion. Metal-containing fine particles with their surface coated with at least two dispersants having different vaporization temperatures.

Process for producing metal-containing particles having their surface coated with at least two dispersants different in vaporization temperature

Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.

Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds

The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium compound. The raw material solution can precisely control the composition of a PZT thin film over a broad temperature range. The raw material solution is less likely to react an organolead compound even when mixed with the organolead compound. The present invention provides a raw material solution which is less likely to cause vapor phase cracking. The organozirconium composite comprises one, or at least two kinds of zirconium chelate complexes containing, as a ligand, both of a first &#x3b2; diketone and a second &#x3b2; diketone having a structure different from that of the first &#x3b2; diketone, wherein, when at least two kinds of zirconium chelate complexes are contained, the coordination numbers of the first &#x3b2; diketone and the second &#x3b2; diketone that coordinate to at least two kinds of zirconium chelate complexes vary depending on the respective zirconium chelate complexes.

Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film

Organozirconium compound, organic solution comprising same, and zirconium-containing thin film therefrom

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Yokohama, Japan

Hideyuki Hirakoso