Mitsubishi Denki Kabushiki Kaisha

Renesas Technology Corp.

Hideyo Haruhana

Yutaka Uneme

Motoshige Igarashi

Seiji Yamamoto

Keiichi Higashitani

Hiroyuki Amishiro

Masao Sugiyama

Akihiko Harada

A chopper comparator has inverters in input and output stages including NMOS transistors to control connection and disconnection of an inverter circuit of each inverter. During a non-operation period of the chopper comparator, parts of the inverters are disconnected form the ground based on a signal supplied to gates of the NMOS transistors.

Chopper comparator

In a semiconductor substrate, at least one diffusion region exists between resistors on an element isolation layer, and the resistors and the diffusion regions are arranged such that all distances between the respective resistors and the diffusion regions around the corresponding resistors are equal.

Semiconductor device including resistors isolated and equdistant from diffusion regions

A semiconductor device, having a multi-layer interconnection structure, is provided which comprises a semiconductor substrate and a plurality of interlayer insulating films formed on the semiconductor substrate. A plurality of conductive leads are formed in the interlayer insulating films. In one of the interlayer insulting films having conductive lead or leads, at least one conductive plug is formed vertically to connect the conductive leads in different interlayer insulating films. Further, adjacent conductive leads may be formed in an adjacent interlayer insulating films are connected together to form a unified conductive lead.

Semiconductor device having an improved multi-layer interconnection structure and manufacturing method thereof

A method of manufacturing a semiconductor device which prevents a short circuit between a gate electrode and a diffusion layer region if a contact hole is shifted from its proper position. A material having an etch selectivity to an interlayer insulation film is formed over the gate electrode to serve as a cover against the formation of a contact hole. A material is not formed over an interconnect line which is required to be exposed to a contact hole.

Growing community of inventors

Tokyo, Japan

Hideyo Haruhana