Hitachi Chemical Company, Ltd.

Hideyasu Tsuiki

Hiroyuki Tanaka

Seiji Tai

Seikichi Tanno

Takeshi Nojiri

Hajime Kakumaru

Koichi Kamijima

Toshihiko Takasaki

Hiroshi Matsutani

Haruaki Sue

Ikuo Mukai

Naoki Kimura

Kazuya Sato

Takashi Kumaki

Iwao Fukuchi

Yumiko Wada

The present invention discloses a sulfur-containing phenolic resin which comprises an organic group represented by the following formula (1):&#x2014;R&#x2014;S&#x2014;R&#x2014;S&#x2014;R&#x2014;&#x2003;&#x2003;(1) 

Sulfur-containing phenolic resin, process for preparing the same, phenol derivatives having thioether structure or disulfide structure, process for preparing the same and epoxy resin composition and adhesive

Disulfide-containing phenolic resin as curing agent for epoxy resin

Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (&mgr;m), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9&times;L from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4&times;L from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.

Photosensitive element for preparing a phosphor pattern

Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same

Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same

Disclosed are a photosensitive resin composition which comprises:

Photosensitive resin composition, photosensitive film and process for

Growing community of inventors

Hitachi, Japan

Hideyasu Tsuiki