Socionext Inc.

Fujitsu Corporation

Fujitsu Microelectronics Limited

Hidetoshi Tanaka

Hiroyuki Sugamoto

Yasushige Ogawa

Isaya Sobue

Chika Ito

Yasushige Tanaka

Mai Tsukamoto

In a semiconductor integrated circuit device, first and second interconnects extending in the X direction are formed in a metal interconnect layer. The first and second interconnects are placed on the opposite sides of each resistor element in the X direction and connected to the resistor element. The first interconnect is connected to PAD, and a third interconnect is connected to VSS. In an ESD protection diode, an anode and a cathode are formed alternately in the Y direction. The resistor element and the first and second interconnects overlap the cathode of the ESD protection diode, and the third interconnect overlaps the anode of the ESD protection diode, in planar view.

Semiconductor integrated circuit device

In an output circuit of a semiconductor integrated circuit device, an output transistor is placed apart from an ESD protection diode connected to an external output terminal, and a protection resistance is placed between them. The protection resistance is formed as a plurality of separate resistance regions, and taps supplying a power supply voltage to a substrate or a well are formed between the resistance regions. Noise applied to the external output terminal is attenuated by the protection resistance before reaching the output transistor and absorbed through the taps.

A semiconductor integrated circuit device includes a core region and an IO region on a chip. In an IO cell row placed in the IO region, a first power supply line extending in the X direction in a low power supply voltage region has a portion protruding to the core region. A signal IO cell has a reinforcing line that connects a second power supply line extending in the X direction in the low power supply voltage region and a third power supply line extending in the X direction in a high power supply voltage region, the reinforcing line extending in the Y direction in a layer above the second and third power supply lines.

An ESD protection diode in a semiconductor device includes: a semiconductor substrate; a diode group that has a plurality of grouped VNW diodes, each of the VNW diodes having a VNW having a lower end and an upper end, that are formed on the semiconductor substrate and have a semiconductor material; and a top plate that is formed above the diode group and is a conductive layer electrically connected to the upper ends of the VNWs of the respective VNW diodes, and there is fabricated the semiconductor device that is capable of, even when large current flows through the VNW diode, suppressing current concentration and preventing damage of the VNW diode.

Interconnected vertical diode group

A semiconductor device includes: a semiconductor substrate; a VNW transistor being a functional element provided with a first projection formed on the semiconductor substrate, having a semiconductor material, and having a lower end and an upper end; a dummy functional element provided with a second projection formed on the semiconductor substrate, having a semiconductor material, having a lower end and an upper end, and arranged side by side with the first projection; and a first wiring formed above the first projection and above the second projection, electrically connected to the upper end of the first projection, and electrically isolated from the upper end of the second projection. Consequently, the semiconductor device capable of suppressing variation in characteristics of the VNW transistors is realized.

Semiconductor device

An ESD protection circuit includes a first fin structure having fins of a first conductivity type and a second fin structure having fins of a second conductivity type, the second fin structure being opposed to the first fin structure. A first power interconnect connected with the first fin structure and a signal interconnect connected with the second fin structure are formed in a first interconnect layer, and a second power interconnect connected with the first power interconnect is formed in a second interconnect layer. The width occupied by the second fin structure is greater than that of the first fin structure, and the width of the signal interconnect is greater than that of the first power interconnect.

A semiconductor device has transistors formed on a substrate and including first and second impurity regions of a first conductivity type, a guard ring of a second conductivity type formed on the substrate and surrounding the transistors in a plan view, a wiring formed on and electrically connected to the guard ring, and a ground wiring formed on the wiring and electrically connected to the wiring and the second impurity region. In a plan view, the transistor includes a first part having a distance that is a first distance from the guard ring, and a second part having a distance that is a second distance shorter than the first distance from the guard ring. In a plan view, the first part is located at a position separated from the ground wiring, and the second part is located at a position overlapping the ground wiring.

A semiconductor device includes a first transistor formed on a substrate and including first and second impurity regions, a second transistor formed on the substrate and including a third impurity region electrically connected to the second impurity region, and a fourth impurity region, a power supply terminal electrically connected to the first impurity region, a ground terminal electrically connected to the fourth impurity region, a first guard ring surrounding the first transistor in a plan view and electrically connected to the ground terminal, and a second guard ring surrounding the second transistor in a plan view and electrically connected to the ground terminal. A conductivity type of the first through fourth impurity regions is different from a conductivity type of the first and second guard rings. The second guard ring has a width narrower than a width of the first guard ring in a plan view.

A semiconductor device has transistors formed on a substrate and including first and second impurity regions of a first conductivity type, a guard ring of a second conductivity type formed on the substrate and surrounding the transistors in a plan view, a wiring formed on and electrically connected to the guard ring, and a ground wiring faulted on the wiring and electrically connected to the wiring and the second impurity region. In a plan view, the transistor includes a first part having a distance that is a first distance from the guard ring, and a second part having a distance that is a second distance shorter than the first distance from the guard ring. In a plan view, the first part is located at a position separated from the ground wiring, and the second part is located at a position overlapping the ground wiring.

An output circuit includes a driver circuit and a node control circuit. The driver circuit includes a first transistor and a second transistor. The first transistor includes one end coupled to an external terminal and the other end coupled to a first node. The second transistor includes one end coupled to the first node and the other end coupled to a wiring that is supplied with a power supply voltage. When the first transistor and the second transistor are deactivated, the node control circuit supplies a node control signal based on a voltage of the external terminal to the first node.

Output circuit

The present invention provides a synchronous semiconductor device suitable for improving the efficiency of application of electrical stresses to the device, an inspection system and an inspection method thereof in order to efficiently carrying out a burn-in stress test. A command latch circuit having an access command input will output a low-level pulse in synchronism with an external clock. The pulse will pass through a NAND gate of test mode sequence circuit and a common NAND gate to output a low-level internal precharge signal, which will reset a word line activating signal from the control circuit. Simultaneously, an internal precharge signal passing through the NAND gate will be delayed by an internal timer a predetermined period of time to output through the NAND gate a low-level internal active signal, which will set a word line activating signal from the control circuit.

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Kasugai, Japan

Hidetoshi Tanaka