Disco Corporation

Hidetoshi Mannami

Kohei Tanaka

Taiki Sawabe

Wakana Onoe

Hiroshi Nomura

Yutaka Kobayashi

Hisatoshi Fujisawa

Disclosed herein is a laser processing apparatus including first and second laser mechanisms, a laser oscillator for oscillating an original laser beam, an optical system for branching the original laser beam into first and second laser beams, and first and second operation panels for respectively setting first and second processing conditions for the first and second laser mechanisms. The first and second laser mechanisms include first and second chuck tables for holding first and second workpieces, first and second X moving units for moving the first and second chuck tables in an X direction, first and second Y moving units for moving the first and second chuck tables in a Y direction perpendicular to the X direction, and first and second focusing units for focusing the first and second laser beams to the first and second workpieces held on the first and second chuck tables, respectively.

Laser processing apparatus

A laser processing apparatus includes a controller having (a) a section for storing the Y coordinate of a characteristic point having a predetermined positional relation to each division line formed on a wafer as a reference value with respect to a reference position where the focal point of a laser beam coincides with a predetermined position on each division line, (b) a section for detecting the amount of deviation of the Y coordinate of the characteristic point after indexing each division line of the wafer in the Y direction by the operation of a Y moving unit, from the Y coordinate stored as the reference value, and (c) a section for determining whether or not the amount of deviation detected is greater than an allowable value.

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Tokyo, Japan

Hidetoshi Mannami