Max-planck-gesellschaft Zur F&#xf6;rderung Der Wissenschaften E. V.

Rohm Gmbh

Hideto Sotobayashi

Frithjof Asmussen

Wolfram Schnabel

Peter Quis

Winfried Wunderlich

Jiang-Tsun Chen

A radiation sensitive polymeric material comprising a copolymer of methyl methacrylate and allyl methacrylate and at least one organosulfur compound having at least two --SH groups per molecule, said material being useful as a polymer resist sensitive to high energy radiation.

Radiation sensitive polymeric material

The invention relates to positive resist materials of thermally crosslinkable methacrylic polymers soluble in organic solvents, which are characterized in that the methacrylic polymers are copolymers of 80 to 98 mol-% of fluoroalkylmethacrylate and 20 to 2 mol-% of methacrylic acid chloride or chloroalkylmethacrylate. The resists of the invention are very well suited for the transfer of microstructures, for example in semiconductor technology. They have, in addition to a high sensitivity, a very good mechanical stability and strength of adhesion.

Positive resist material

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Berlin, Germany

Hideto Sotobayashi