Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hideto Dohi

Hideyuki Kazumi

Akira Ikegami

Zhaohui Cheng

Naomasa Suzuki

Momoyo Enyama

Shingo Hayashi

Yoshinobu Ootaka

Muneyuki Fukuda

Pieter Kruit

Yoichi Ose

Yasutaka Toyoda

Wen Zheng Li

Hiroya Ohta

Hideo Kashima

Tomoyasu Shojo

Yuta Kawamoto

Manabu Yano

Yutaka Tandai

Tomoyo Sasaki

Takayasu Iwatsuka

Ryuji Nishi

Akio Takaoka

Masanori Mita

Masashi Inada

The charged particle beam apparatus includes a charged particle source generating a charged particle beam, a deflector deflecting the charged particle beam, a detector detecting secondary electrons emitted from an irradiation target in response to irradiation with the charged particle beam, and a processor system. The processor system (A) acquires a first time-series change in secondary electron detection-related quantity by repeatedly performing the following (A) and (A), (A) directly or indirectly, maintains or changes the control amount applied to the deflector to a first control amount, and (A) acquires the secondary electron detection-related quantity based on an output from the detector, and (B) acquires a time-series change in variation of the beam diameter of the charged particle beam based on the first time-series change.

Charged particle beam apparatus

A training method that performs learning using appropriate low-quality image and high-quality image is provided. The invention is directed to a training method including executing learning by inputting a first image generated under a first image generation condition and a second image generated under a second image generation condition different from the first image generation condition to a learning apparatus that adjusts parameters so as to suppress an error between an input image and a converted image, in which the second image is selected such that an index value extracted from the second image is the same as or has a predetermined relationship with an index value extracted from the first image, or the second image is output from a second image generation tool different from a first image generation tool for generating the first image.

Training method for learning apparatus, and image generation system

The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG.A).

Charged particle beam device, and method for controlling charged particle beam device

A charged particle optical system includes an aberration correctorthat corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detectorby irradiating a sample with the charged particle beam before and after the first multipole field is generated.

Charged particle beam device and aberration correction method

The present disclosure pertains to a beam deflection device capable of properly deflecting a beam. The present disclosure provides a beam deflection device for deflecting a beam inside a charged particle beam device, said beam deflection device being provided with: one or more electrostatic deflectors () each having a pair of electrodes disposed so as to face each other across a beam path in a first direction orthogonal to the beam path; and one or more magnetic deflectors () each having a pair of magnetic poles disposed so as to face each other across the beam path in a second direction orthogonal to the beam path and to the first direction. When viewed from an incident direction of the beam, the one or more electrostatic deflectors and the one or more magnetic deflectors are stacked along the beam path such that the pair of electrodes at least partially overlap with the pair of magnetic poles and with a gap between the pair of magnetic poles.

Beam deflection device, aberration corrector, monochromator, and charged particle beam device

An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unitincludes a polethat is made of a soft magnetic metal material, a shaftthat is made of a soft magnetic metal material and is magnetically connected to the pole, and a coilthat is wound around the shaft. The poleis provided with a first fitting portion JPthat forms a first recessed portion or a first protruding portion. The shaftis provided with a second fitting portion JPthat forms a second protruding portion or a second recessed portion. The first fitting portion JPand the second fitting portion JPare fitted with each other such that the poleand the shaftare physically separated from each other.

Multipole unit and charged particle beam device

Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipolecomprises: a plurality of poles Q-Qthat are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P-Pthat are arranged between the plurality of poles Q-Qand are made of an insulator. The poles Q-Qand the braces P-Pare joined by fitting the braces P-Pinto the cutouts N and applying brazing so as to be interposed by a bonding material.

Multistage-connected multipole, multistage multipole unit, and charged particle beam device

A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.

Charged particle beam device

In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.

The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole. The aberration generating element has such a function that when the charged particle beam is tilted relative to the sample by the tilt-use deflector, a plurality of resulting aberrations are cancelled with one another. Moreover, the first electromagnetic field superposing multipole has a function to change the orbit of a charged particle beam having energy different from that of the main charged particle beam in the charged particle beam.

Charged particle beam application device

Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

Charged particle-beam device

There is provided a charged particle beam apparatus that includes a trajectory monitoring unit which is disposed above an objective lens () and which includes an optical element () having a lens action and a trajectory correcting deflector (). An applied voltage and an excitation current of the optical element () are set to zero after a trajectory correction of a primary charged particle beam (). Accordingly, the lens action and an aberration of the optical element () have no influence on resolution.

Charged particle beam apparatus and trajectory correction method in charged particle beam apparatus

In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles () generated by irradiating a sample () with a primary charged particle beam () is provided with a beam tilt lens () having: a yoke magnetic path member () and a lens coil () to focus the primary charged particle beam () on the sample (); and a solenoid coil () configured to arrange the upper end on the side surface of the yoke magnetic path member () and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member () and the sample () in order to arbitrarily tilt the primary charged particle beam () on the sample ().

The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.

Growing community of inventors

Tokyo, Japan

Hideto Dohi