Ciba Specialty Chemicals Corporation

Basf Se Corporation

Basf Se Ludwigshafen

Udc Ireland Limited

Hidetaka Oka

Masaki Ohwa

Hisatoshi Kura

Junichi Tanabe

Jean-Luc Birbaum

Kazuhiko Kunimoto

Hiroshi Yamamoto

Akira Matsumoto

Hiroko Nakashima

Jean-Marie Adam

Kurt Dietliker

Martin Kunz

Akira Kimura

Mathias Düggeli

James Philip Taylor

Preetam Ghogale

Ramachandra V Joshi

Hitoshi Yamoto

Sanjoy Lahiri

Dhaval Vashi

The present invention relates to electroluminescent devices that comprise organic layers that contain triazole compounds of the formula (I), or formula (II). The compounds are suitable components of, for example, blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in, for example, mobile phones, televisions and personal computer screens.

Electroluminescent device

Disclosed are electroluminescent devices that comprise organic layers that contain dibenzofuran compounds. The compounds are suitable components of, for example, blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in, for example, mobile phones, televisions and personal computer screens.

The present invention relates to a photosensitive resin composition comprising a) as a component (A) a green colorant of the formula (I) in which the rings A, B, C and D are substituted by hydroxy or by moiety wherein R, is hydrogen or C,-C.-Alkyl, Ris hydrogen or C,-C-Alkyl, n is 0, 1, 2 or 3 and the ring E is unsubstituted or substituted by C,-Calkyl, C,-Calkoxy, hydroxy, NHCOR, NHSO, Ror SONHR, wherein R, is C,-C,-Alkyl or phenyl, R, is C,-C-Alkyl or phenyl and Ris C,-C-Alkyl or phenyl, b) as a component (B) an alkali soluble oligomer or polymer (reactive or unreactive), c) as a component (C) a polymerizable monomer, d) as a component (D) a photoinitiator, e) as a component (E) an epoxy compound, and also, if desired, f) as a component (F) further additives, used as solder resist, etching resist or plating resist in the manufacture of printed circuit boards. 

Photosensitive resin composition comprising a halogen-free colorant

The present invention relates to fluorescent diketopyrrolopyrroles of the formula (I), or (III), a process for their preparation and their use for the preparation of inks, colorants, pigmented plastics for coatings, non-impact-printing material, color filters, cosmetics, polymeric ink particles, toners, as fluorescent tracers, in color changing media, in solid dye lasers, EL lasers and electroluminescent devices. A luminescent device comprising a compound, or composition according to the present invention is high in the efficiency of electrical energy utilization and high in luminance. 

Fluorescent diketopyrrolopyrroles

Photosensitive compositions comprising wherein

Photosensitive resin composition

Compounds of the formula (I), wherein R, Rand Rindependently of one another are C-Calkyl, phenyl, C-Calkylphenyl or phenyl-C-Calkyl; Rand Rindependently of one another are hydrogen, C-Calkyl, NRRor SR, provided that at least one of Ror Ris NRRor SR; Ris hydrogen or C-Calkyl; Rand Rindependently of one another are C-Calkyl, or Rand Rtogether with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NRand which optionally additionally is substituted by one or more C-Calkyl; Ris phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C-Calkyl; and Ris hydrogen, C-Calkyl, C-Chydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions. 

Oxime ester photoinitiators

Compounds of the formulae (I), (II), (III) and (IV), wherein Chis e.g. the formula (V) or (VI); Chis the formula (VII) or (VIII); Hetis for example furyl, thienyl, pyrrolyl, pyridyl, benzothienyl, quinolyl or bithienyl; each of which is optionally substituted; Hetand Het' e.g. are furylene, thienylene, pyrrolylene, benzothienylene, quinolylene, furylenecarbonyl, thienylenecarbonyl, benzothienylenecarbonyl or bithienylenecarbonyl; each of which is optionally substituted; A, and Ar&#x2032; i.a. are phenyl, naphthyl, benzoyl or naphthoyl, each of which is optionally substituted; Aris for example phenylene, optionally substituted; M i.a. is C-Calkylene; Ris for example C-Calkyl or phenyl; Rand R&#x2032; for example are hydrogen or C-Calkyl; exhibit an unexpectedly good performance in photopolymerization reactions. 

Oxime ester photoinitiators with heteroaromatic groups

A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises

Photosensitive compositions which can be developed by alkali solution, comprise

Compounds of the formulae I, II, III, IV and V wherein optionally substituted; or Aris naphthyl or anthracyl each of which is unsubstituted or substituted; or Aris benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Aris 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ari.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; Mwhen x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M, when x is 3, is a trivalent radical; Mfor example is Mis for example C-Calkylene, cyclohexylene, or phenylene; n is 1-20; Ris for example hydrogen or C-Calkyl; R' i.a. is C-Calkyl; substituted or &#x2014;O-interrupted C-Calkyl; Ris for example hydrogen, or C-Calkyl; and Rand Rindependently of each other i.a. are hydrogen, C-Calkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

A photosensitive composition comprising, 

The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 &#x3bc;m and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20&#x2013;90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.1 to 10% by weight of a leuco triphenylmethane dye of the formula (I), wherein Ris a residue selected from (II), Ris C&#x2013;Calkyl or phenyl which may be mono-, di- or tri-substituted by C&#x2013;Calkyl, trifluoromethyl, Calkoxy, Calkylthio, halogen and nitro; Ris hydrogen or C&#x2013;Calkyl; Rto Rindependently of one another are hydrogen or C&#x2013;Calkyl; X is O, S, NH or N&#x2014;C&#x2013;C-alkyl; (a) to (e) being 100% by weight. The above composition is useful to avoid unfavourable colour generation during the heat lamination 

Heat stable photocurable resin composition for dry film resist

Compounds of the formulae I, II and III wherein Ris for example hydrogen, C&#x2013;Ccycloalkyl, C&#x2013;Calkyl, phenyl unsubstituted or substituted; Rand R' for example are hydrogen, C&#x2013;Calkyl, C&#x2013;Ccycloalkyl or phenyl, unsubstituted or substituted, or are Aris for example phenyl, optionally substituted by e.g. Aris for example phenylene, optionally substituted e.g. by &#x2014;(CO)R, (D), (E) or (F); Aris for example phenyl; M, Mand Mare, for example, C&#x2013;Calkylene; Mis for example direct bond, &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;Y&#x2014;(C&#x2013;Calkylene)-Y&#x2032;&#x2014;, optionally substituted; Y and Y&#x2032; are for example a direct bond or &#x2014;O&#x2014;; Ris for example hydrogen, C&#x2013;Calkyl or phenyl, optionally substituted; R, R, R&#x2032; and R&#x2032; are for example hydrogen or C&#x2013;Calkyl, exhibit an unexpectedly good performance in photopolymerization reactions.

Growing community of inventors

Takarazuka, Japan

Hidetaka Oka