Kawasaki Microelectronics, Inc.

Hidetaka Horiuchi

Katsunori Suzuki

Yasushi Kikuchi

Jin Yokogawa

Ryouichi Kubo

Koji Wakabayashi

Apparatus and methods for producing semiconductor devices are disclosed. A processing chamber includes an interior component having a stepped region including a plurality of raised sections and recessed sections divided by steps. With this apparatus, it is possible to prevent a film of deposited material formed on the stepped region from peeling, thereby decreasing the number of particles in the chamber and increasing the operation rate.

Method and apparatus for processing semiconductor substrates

Apparatus and methods for producing semiconductor devices are disclosed. A processing chamber includes an interior component having a stepped region including a plurality of raised sections and recessed sections divided by steps. With this apparatus, it is possible to prevent a film of deposited material formed on the stepped region from peeling thereby decreasing the number of particles in the chamber and increasing the operation rate.

Growing community of inventors

Haga-machi, Japan

Hidetaka Horiuchi