Toray Industries, Inc.

Hideshi Nomura

Masaya Asano

Masuichi Eguchi

Tetsuya Goto

Shinichi Yamada

Keiji Tsuda

Hideo Ido

Junji Kajita

The present invention provides a liquid crystal display element substrate having spacers fixed in non-display regions on the liquid crystal display element substrate, where the load compression displacement of these spacers in terms of a compression stress of 0.5 to 0.6 GPa is from 0.001 to 1 &mgr;m/mN. Further, it provides a liquid crystal display device which is characterized in that, in a liquid crystal display device where a liquid crystal layer is held between two liquid crystal display element substrates, at least one of these liquid crystal display element substrates is an aforesaid liquid crystal display element substrate. As well as realizing a sufficient cell gap the present invention has the effect that, by maintaining a uniform cell gap within the screen, the problems of a lowering in the display quality due to change in the cell gap and the generation of bubbles at the time of low temperature are resolved. The liquid crystal display element substrate of the present invention and the liquid crystal display device which employs it may be used as the display screens of personal computers, word processors, engineering work stations, navigation systems, liquid crystal televisions, videos and the like, and they are also suitable for use in liquid crystal projection, etc. Further, in the fields of optical communication and optical data processing, they are suitable for use as a spatial light modulator employing liquid crystals.

LCD with spacers having particular characteristics including compression stress

A photosensitive polyimide precursor composition containing as main ingredients a poly(amic acid) wherein at least one molecular end is esterified with an alcohol, a compound containing carbon-carbon unsaturation having photoreactivity, and a photopolymerization initiator. The photosensitive polyimide precursor composition of the present invention can be prepared without the formation of any harmful by-product. When film formed from this composition is masked for patterning and then subjected to exposure and development using a developer, the amount of exposed portion dissolved in the developer until unexposed portion is dissolved off by the developer, is small and so it is possible to obtain a thick pattern. Further, by heat-treating this pattern, there can be obtained a thick polyimide pattern.

Photosensitive polyimide precursor compositions and process for

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Tokyo, Japan

Hideshi Nomura