Shin-etsu Chemical Co., Ltd.

Hideshi Kurihara

Takeshi Kinsho

Tsutomu Ogihara

Takaaki Shimizu

Tatsushi Kaneko

Mutsuo Nakashima

Ryuichi Saito

Tadashi Amano

Takashi Kobayashi

Jun Hatakeyama

Koji Hasegawa

Takeru Watanabe

Osamu Watanabe

Tsunehiro Nishi

Takanobu Takeda

Toshio Shinohara

Yoshitaka Okuno

Tohru Nishikawa

Kazuyuki Asakura

Toshiaki Takahashi

Tomohisa Suzuki

Tadaaki Kurokawa

Chemically amplified positive resist compositions comprising a polymer obtained by copolymerizing a silicon-containing monomer with a polar monomer having a value of LogP or cLogP of up to 0.6 and optionally hydroxystyrene, a photoacid generator and an organic solvent are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching.

Resist composition and patterning process

A novel ester compound having an exo-form 2-alkylbicyclo&lsqb;2.2.1&rsqb;heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

Ester compounds, polymers, resist compositions and patterning process

A silacyclohexane compound represented by the following general formula (I). ##STR1## In this formula, R denotes a linear-chain alkyl group with 1-10 carbon atoms, a branched-chain alkyl group with 3-8 carbon atoms, a mono- or di-fluoroalkyl group with 1-10 carbon atoms, an alkoxyalkyl group with 2-7 carbon atoms, or an alkenyl group with 2-8 carbon atoms. ##STR2## is trans-1-silacyclohexylene or trans-4-silacyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. X denotes a R, OR, CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, --(O).sub.m --CY.sub.1 .dbd.CX.sub.1 X.sub.2 (m denotes 0 or 1, Y.sub.1 and X.sub.1 respectively denote H, F or Cl, and X.sub.2 denotes F or Cl) or --O--C.sub.r F.sub.s H.sub.2r+1-s is (r denotes an integral of 2 to 4 and s denotes an integral of 1 to 7) group. Y denotes H or F. Z denotes H or F.

Silacyclohexane compound, a method of preparing it and a liquid crystal

Liquid crystal compositions which can improve the low .DELTA.n (refractive index anisotropy) of conventional liquid crystal compositions containing a silacyclohexane compound and which retain a low viscosity and hence show no decrease in response speed. Liquid crystal compositions having a high .DELTA.n of 0.13 to 0.25, a low viscosity of 30 cp or less, a low threshold voltage and a high voltage holding ratio can be obtained by adding thereto, as a required component, a compound having both a silacyclohexane ring and a tolan structure, or a miture of a compound having a silacyclohexane ring and a compound having a tolan structure.

Liquid crystal compositions and liquid crystal display elements

Novel 1,1,2,2-tetramethylpropylperoxy esters are provided. They are useful as a polymerization initiator in polymerizing vinyl chloride, vinylidene chloride and vinyl acetate monomers, with the advantage of completing polymerization within a short time.

1,1,2,2-tetramethylpropylperoxy esters and method for preparing vinyl

A vinyl chloride polymer is prepared through suspension polymerization of a vinyl chloride monomer in the presence of a polymerization initiator in a reactor. The reactor is charged with up to 4/5 of the overall monomer charge to initiate polymerization. Polymerization is carried out under a certain saturated vapor pressure of P1 kgf/cm.sup.2 at a preset polymerization temperature. When the internal pressure of the reactor declines to P2 kgf/cm.sup.2, the remainder of the overall monomer charge is continuously fed to the reactor so as to maintain the internal pressure within the range of (P1-.DELTA.P) wherein .DELTA.P=P1-P2 ranges from 0.1 to 2.0 kgf/cm.sup.2. A vinyl chloride polymer having a high degree of polymerization is efficiently produced while alleviating the load of heat removal.

Process for preparing vinyl chloride polymer under specified vapor

Silicon-containing peroxyester compounds, for example, represented by the following formula: ##STR1## useful as a polymerization initiator, which compounds can produce vinyl chloride polymers having a high quality in a high yield and in a short reaction time.

Silicon-containing peroxyesters

A silacyclohexane compound represented by the following general formula (I). ##STR1## In this formula, R denotes a linear-chain alkyl group with a carbon number of 1-10, a mono- or di- fluoro-alkyl group with a carbon number of 1-10, a branched-chain alkyl group with a carbon number of 3-8, an alkoxyalkyl group with a carbon number of 2-7, or an alkenyl group with a carbon number of 2-8. ##STR2## denotes trans-1-sila-1,4-cyclohexylene or trans-4-sila-1,4-cyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. X denotes a CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, R or OR group (R is the same as defined in the general formula (I)). Y.sub.2 and Z denote H or F, independently to each other. Y.sub.1 denotes H, F or Cl.

A silacyclohexane compound of the following formula (I) ##STR1## wherein R is an unsubstituted or substituted organic residue, W is H, F, Cl or methyl, X is CN, F, Cl or an unsubstituted or substituted organic residue, and Y and Z independently represent H, F or Cl. The silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.

Silacyclohexane compounds, a liquid crystal composition comprising the

A silacyclohexane compound of the following formula (I) or (II) ##STR1## wherein R is an organic residue, ##STR2## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, L.sub.1 and L.sub.2 independently represent H, F, Cl or CH.sub.3 ; and X represents an organic residue, CN, F or Cl, or ##STR3## wherein R, L.sub.1, L.sub.2 and X are, respectively, as defined above, and at least one of ##STR4## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, and the other may be a trans-1,4-cyclohexylene group. The preparation of these compounds is described along with a composition comprising the compound (I) and/or (II) and a display device comprising the composition.

Silacyclohexane compounds, preparation thereof, liquid crystal

A silacyclohexane compound of the following formula (I) ##STR1## wherein R represents an organic residue; ##STR2## represents a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group having a substituent of H, F, Cl or CH.sub.3 ; L.sub.1 represents F, L.sub.2 and L.sub.3 independently represent H, F, Cl or CH.sub.3 ; X represents an organic residue, F or Cl; and n is an integer of 0, 1, or 2 and a and b are, respectively, 0 or 1 provided that a+b=1. Silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.

A silacyclohexane compound of the following formula (I) ##STR1## wherein R represents an organic residue; at least one of ##STR2## represents a substituted or unsubstituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group and the other represents a trans-1,4-cyclohexylene group, L.sub.1 and L.sub.2 independently represent H, F, Cl or CH.sub.3 ; X represents an organic residue or CN, F, Cl; and m and n are, respectively, 0 or 1 provided that m+n=1. Silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.

A silacyclohexane compound represented by the following general formula (I). ##STR1## In this formula, R denotes a linear-chain alkyl group with a carbon number of 1-10, a fluoroalkyl group with a carbon number of 1-10 in which a fluorine atom(s) is substituted for one or two hydrogen atoms, an alkoxy group, a branched-chain alkyl group with a carbon number of 3-8, an alkoxyalkyl group with a carbon number of 2-7, or an alkenyl group with a carbon number of 2-8. a and b denote 0 or 1 and (a+b)=0 or 1; For ##STR2## at least one of the two denotes a trans-1-sila-1,4-cyclohexylene or a trans-4-sila-1,4-cyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. X denotes H, CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCF.sub.2 Cl, OCHFCl, OCHF.sub.2, R or OR. Y and Z denote F, Cl or CH.sub.3. i and j denotes 0, 1 or 2.

A silacyclohexane compound represented by the following general formula (I) ##STR1## wherein R denotes a linear-chain alkyl group with a carbon number of 1-10, a fluoroalkyl group with a carbon number of 1-10 in which a fluorine atom(s) is substituted for one or two hydrogen atoms, a branched-chain alkyl group with a carbon number of 3-8, an alkoxyalkyl group with a carbon number of 2-7, or an alkenyl group with a carbon number of 2-8. ##STR2## denotes a trans-1-sila-1,4-cyclohexylene or trans-4-sila-1,4-cyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. L.sub.1 and L.sub.2 independently denote H or F. L.sub.3 and L.sub.4 independently denote H, F or Cl. X denotes a H, CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCF.sub.2 Cl, OCHFCl, OCHF.sub.2, or a linear-chain alkyl or alkoxy group with a carbon number of 1-10. i, j and k respectively denote 0 or 1, where (i+j+k) is 0 or 1. n denotes 0, 1 or 2.

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Kawasaki, Japan

Hideshi Kurihara