Tpo Hong Kong Holding Limited

Kawasaki Jukogyo Kabushiki Kaisha

Hideo Tanaka

Noriaki Izumi

Hironori Tajiri

Takashi Nishino

Hiromasa Kusuda

Shoji Tsujita

Ryoji Obara

A biomass cake pressure-feeding apparatus includes: a screw pump including a first screw with a helical first conveying thread, a second screw with a helical second conveying thread, and a casing accommodating the first screw and the second screw such that the first screw and the second screw are parallel to each other, the screw pump being configured to feed biomass cake to a high pressure reactor, the biomass cake being obtained by adding water to powdery biomass; and a throttle part positioned downstream of the screw pump and configured to form a material seal made of the biomass cake by restricting a flow of the biomass cake.

Biomass cake pressure-feeding apparatus

A source electrode and a drain electrode on a silicon oxide film () each has a double-layered structure of an ITO film (), a transparent electrode, and a metal film () formed on the ITO film (). A gap (), no source electrode and drain electrode region, is formed between the source electrode and the drain electrode. A silicon nitride film () (a gate insulating film) is formed on the source electrode and the drain electrode and in the gap (). The silicon nitride film () is a first region Dhaving a relatively large thickness and a second region Dhaving a relatively small thickness. The region Dof the silicon nitride film () is provided with an MIM structure. A gate bus layer () is formed on the silicon nitride film (). An MIM structure is formed in the second region D.

Liquid crystal display device having ESD protection circuit and method for manufacturing the same

A method of the present invention includes the steps of forming an organic material film having projections and depressions, using a photo-embossing material, on an insulating film on an underlying electrode in a thin-film transistor of an active-matrix liquid crystal display device; exposing the insulating film in a contact-hole-forming-area by reducing a thickness of the organic material film by a dry etching to said organic material film; forming a contact hole and exposing the underlying by a dry etching to the exposed insulating film; and contacting the exposed underlying electrode with a reflective electrode by forming the reflective electrode on the resulting structure.

Method of manufacturing liquid crystal display device

Growing community of inventors

Kobe, Japan

Hideo Tanaka