Hitachi, Ltd.

Panasonic Liquid Crystal Display Co., Ltd.

Japan Display Inc.

Hitachi Displays, Ltd.

Hitachi Global Storage Technologies Japan, Ltd.

Hitachi Maxell, Limited

Hitachi Global Storage Technologies

Hideo Tanabe

Masahiro Kitada

Isamu Yuito

Noboru Shimizu

Hisashi Takano

Naoki Koyama

Kazuo Shiiki

Toshio Kobayashi

Toshiki Kaneko

Masaru Takabatake

Eijin Moriwaki

Atsushi Hasegawa

Hiroko Sehata

Ryoichi Nakatani

Masaaki Futamoto

Yoshibumi Matsuda

Mikio Suzuki

Kyo Akagi

Takeshi Nakao

Yoshinori Miyamura

Fumio Kugiya

Hirotsugu Fukuoka

Takayuki Munemoto

Tokuho Takagaki

Hideo Todokoro

Tohru Ishitani

Tsuyoshi Ohnishi

Chiaki Ishikawa

Hitoshi Nakamura

Yasukazu Kimura

Takao Nakamura

Tetsuo Kobayashi

Makoto Ohkura

Tooru Takeura

Shigeo Shimomura

Masaaki Kurita

Makoto Morijiri

Jun Fujiyoshi

Takao Kawamura

Hiroshi Kawasaki

Masaharu Kumada

Hiroaki Koyanagi

Kazuhiro Momata

Eiji Ashida

Haruko Tanaka

Akira Taniyama

Daisuke Sonoda

Mitsuru Watanabe

Hideo Fujiwara

Hidekazu Miyake

Yoshihisa Kamo

Manabu Yamashita

Akira Misumi

Mamoru Tsuzurahara

Sadao Hishiyama

Yasutaro Uesaka

Katsuo Yuhara

Masataka Okamoto

Hiroshi Tsuchiya

Masao Katsumata

Hideaki Nakatsuka

Masaki Shinoda

Yuichi Kijima

Shigeyoshi Kato

A LCD device having a large pixel holding capacitance includes opposedly facing first and second substrates, and liquid crystal between them. The first substrate includes a video signal line, a pixel electrode, a thin film transistor having a first electrode connected to the video signal line and a second electrode connected to the pixel electrode, a first silicon nitride film formed above the second electrode, an organic insulation film above the first silicon nitride film, a capacitance electrode above the organic insulation film, and a second silicon nitride film above the capacitance electrode and below the pixel electrode. A contact hole etched in both the first and second silicon nitride films connects the second electrode and the pixel electrode to each other. A holding capacitance is formed by the pixel electrode, the second silicon nitride film and the capacitance electrode.

Manufacturing method for liquid crystal display device

A liquid crystal display device includes a first substrate and a second substrate with a liquid crystal layer therebetween. The first substrate includes drain lines, gate lines, thin-film transistors that output signals to pixel electrodes, and an organic film that is formed between each thin-film transistor and each pixel electrode. The organic film has a contact hole for electrical connection between a source electrode of each thin-film transistor and each pixel electrode. A step is formed in a layer underlying the organic film and an edge portion of the organic film toward the thin-film transistor, the edge portion forming the contact hole, being formed to lie on a lower plane of the step. A sidewall part of the contact hole which is formed in the organic film is formed to have a taper angle of at least 60 degrees.

Liquid crystal display device

The present invention provides a liquid crystal display device having gate wires and source/drain wires with a multilayer structure made of the same material which can be manufactured at low cost, as well as a manufacturing method for the same. In accordance with the manufacturing method, a wet etching process is carried out on the gate wires and the source/drain wires using an etchant including hydrofluoric acid and an oxidant, and the concentration of hydrofluoric acid in the etchant is different between the etchant for the gate wires and that for the source/drain wires.

Liquid crystal display device and manufacturing method for same

The present invention provides a liquid crystal display device having a large holding capacitance in the inside of a pixel. A liquid crystal display device includes a first substrate, a second substrate arranged to face the first substrate in an opposed manner, and liquid crystal sandwiched between the first substrate and the second substrate. The first substrate includes a video signal line, a pixel electrode, a thin film transistor having a first electrode thereof connected to the video signal line and a second electrode thereof connected to the pixel electrode, a first silicon nitride film formed above the second electrode, an organic insulation film formed above the first silicon nitride film, a capacitance electrode formed above the organic insulation film, and a second silicon nitride film formed above the capacitance electrode and below the pixel electrode. The second silicon nitride film is a film which is formed at a temperature lower than a forming temperature of the first silicon nitride film. The first silicon nitride film and the second silicon nitride film form a contact hole therein by etching both of the first silicon nitride film and the second silicon nitride film collectively by dry etching. The second electrode and the pixel electrode are connected to each other via the contact hole. A potential different from a potential applied to the pixel electrode is applied to the capacitance electrode, and a holding capacitance is formed by the pixel electrode, the second silicon nitride film and the capacitance electrode.

Manufacturing method of liquid crystal display device

Disclosed is a manufacturing method of a liquid crystal display device where first color filters, second color filters and third color filters which are formed adjacent to each other are provided, the first color filter and the second color filter are patterned in such a manner that one edge portion of the second color filter overlaps an edge portion of the first color filter, and the second color filter and the third color filter are patterned in such a manner that an edge portion of the third color filter overlaps the other edge portion of the second color filter wherein in an exposure step for patterning the second color filter, an exposure quantity in a region corresponding to one edge portion and an exposure quantity in a region corresponding to the other edge portion differ from each other.

Manufacturing method of display device

Growing community of inventors

Mobara, Japan

Hideo Tanabe