Kabushiki Kaisha Toyota Chuo Kenkyusho

Jtekt Corporation

Kabushiki Kaisha Toyota Jidoshokki

Toyota Jidosha Kabushiki Kaisha

Hideo Tachikawa

Kazuyuki Nakanishi

Hiroyuki Mori

Tadashi Oshima

Takashi Iseki

Toshiyuki Saito

Junji Ando

Hideo Hasegawa

Tohru Arai

Fumio Shimizu

Naoyuki Sakai

Takao Kobayashi

Takahiro Sugioka

Toshifumi Sakai

Mamoru Tohyama

Hironori Fujita

Takatoshi Suzuki

Hajime Fukami

Toshihide Ohmori

Ken-ichi Suzuki

Munehisa Matsui

Hiromasa Takeda

Takayuki Kato

Manabu Sugiura

Kenichi Suzuki

Minoru Kawasaki

Hitotoshi Murase

Yasushi Yamada

Koji Nishi

Hiroyuki Ueda

Atsushi Saito

Goro Watanabe

Masayasu Ishiko

Yoshio Shimura

Masaru Okuyama

Hiroshi Moritani

Hiroyuki Kawaura

Yukio Miyachi

Shuichi Yasuda

Hideoki Fukushima

Shigeo Moriyama

Shintaro Igarashi

Shigeru Hotta

Masahiro Suzuki

Kazuyuki Oguri

Yoshiyuki Funaki

Yoshinari Tsuchiya

Mikio Fujioka

Kyouji Itou

Ken-Ichi Suzuki

A coating film removal method for a coated member having a coating film formed over the surface of a substrate is disclosed, which can easily achieve a coating film removal, even for a carbon-based coating film containing carbon as a main component, besides a carbon-based coating film containing a metal element etc. A coated member regeneration method is also disclosed, which removes a coating film from a coated member, and then forms a new coating film over the member, to regenerate the coated member. The coating film removal method is adapted to remove a carbon-based coating film from a coated member () including a substrate, and the carbon-based coating film coated on at least a portion of a surface of the substrate while containing carbon as a main component. The coating film removal method includes bringing a molten salt having an oxidizing function for carbon into contact with the carbon-based coating film, to remove at least a portion of the carbon-based coating film coated over the surface of the substrate. A coated member regeneration method includes removing the carbon-based coating film from the coated member, using such coating film removal method, and subsequently forming a coating film on at least a portion of a surface of the film-removed member ().

Method for removing amorphous carbon coatings with oxidizing molten salts and coated member regeneration method

An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sphybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided

A friction clutch includes an iron inner clutch plate and two iron outer clutch plates. Each clutch plate has a sliding surface that friction-engages with the other clutch plates. A diamond-like carbon film containing silicon, which functions as a solid lubricant, is formed on the sliding surface of each outer clutch plate through a conventional method such as plasma chemical vapor deposition. The diamond-like carbon film contains 1 wt % to 80 wt % of silicon. A coupling device includes a pilot clutch mechanism that has the friction clutch and an electromagnetic actuator. As a result, the friction clutch has an improved resistance to wear, and the coupling device is durable.

Clutch plate, friction clutch, and coupling device

An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace; plural workpiece fixturesfor supporting plural plate-like workpiecesin a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpiecesbeing in a range of 2 to 30 millimeters, the plural workpiece fixturesbeing arranged within the film forming furnaceat a regular angular interval on a circle and being connected to a negative electrode; nozzlesprovided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixturesare arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixturesradially outside thereof; and a plasma power supply connected to at least the workpiece fixtures. By controlling the supply gas pressure to be in a range of 13 to 1,330 Pa and a sheath width to be made in a range of 2 to 30 mm, the discharge is kept stably. As a consequence, it can be realized to form amorphous carbon films efficiently at a low cost.

Amorphous carbon film forming method and device

To provide a sliding member that exhibits excellent durability and is free of lead. A swash plate for a compressor as the sliding member of the invention contains a base material having on the surface thereof a sliding layer constituting at least a sliding surface, on which shoes slide. The sliding layer contains a first layer that contains an amorphous hard carbon (diamond-like carbon) film containing Si (DLC-Si film) and is formed on the base material, and a second layer that is formed on the first layer and contains polyamideimide (PAI) containing a solid lubricant such as MoS.

Sliding member

A drive force transmission device has an outer clutch plate and an inner clutch plate, which are rotatable relative to each other about a common rotational axis. The inner and outer clutch plates become frictionally engaged with each other with lubricant oil provided in between. The outer and inner clutch plates each have a sliding surface. The sliding surfaces face each other. A diamond-like carbon film is formed on the sliding surface of the outer clutch plate. Fine grooves are formed in the sliding surface of the inner clutch plate. The proportion of the sliding area to the sliding surface of the inner clutch plate at the initial stage of use is 55 to 90%.

Drive force transmission device

Under wet sliding conditions using drivetrain system lubricating oils, a high frictional sliding member exhibiting a high friction coefficient, a favorable &#x3bc;&#x2212;v characteristic stably, excellent wear resistance, and low mating-member aggressiveness is provided. The present invention is a wet sliding member comprising: a substrate composed of metal, ceramics, or resin; and an amorphous hard carbon film formed integrally on a surface of the substrate, having a surface, at least a part of which is turned into a sliding surface for sliding under wet conditions, and containing at least either one of Si and N in an amount of from 1 to 50 atomic %.

High friction sliding member

This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.

Wear-resistant copper-based alloy

To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.

Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film

An amorphous-carbon coated member includes a conductive substrate, and an amorphous carbon film. The amorphous carbon film is fixed onto a part of a surface of the substrate at least, and includes a compositionally gradient film. The compositionally gradient film has an outer side and a substrate side, and is composed of carbon, silicon and hydrogen. The silicon concentration inclines continuously from the lowest to the highest in the direction away from the outer side to the substrate side. The hydrogen concentration inclines continuously from the highest to the lowest in the direction away from the outer side to the substrate side. The amorphous-carbon coated member exhibits not only good wear resistance but also low aggressiveness against mating member simultaneously.

Amorphous-carbon coated member

A sliding member includes a superficial portion forming a sliding surface. The superficial portion includes an oxygen-containing alloy containing at least one metallic element selected from the group consisting of molybdenum and tungsten in an amount of from 2 to 80% by weight; and oxygen in an amount of from 0.5 to 15% by weight. The sliding member sustains lubricating characteristics given to the sliding surface over a long period of time to maintain a low friction coefficient and durability.

Sliding member and method for manufacture thereof

A semiconductor element heat dissipating member is provided which has excellent heat dissipation characteristics and adhesion characteristics and enables production of a semiconductor device at a low cost. A semiconductor device using the same, and a method of producing the same are also provided. The semiconductor element heat dissipating member has a conductive substrate and an electrically insulating amorphous carbon film containing hydrogen, and the electrically insulating amorphous carbon film is formed at least on a region of the conductive substrate on which region a semiconductor element is to be mounted.

Semiconductor element heat dissipating member, semiconductor device using same, and method for manufacturing same

A low-friction sliding member is used under a wet condition employing a lubricant, and includes a substrate having a surface, and an amorphous hard carbon film formed on the surface of the substrate for contacting slidably with a mating member. The amorphous hard carbon film includes silicon in an amount of from 1 atomic % or more to 20 atomic % or less, hydrogen in an amount of from 20 atomic % or more to 50 atomic % or less, and the balance of carbon and inevitable impurities, when the entirety is taken as 100 atomic %, and exhibits a surface roughness Rzof 0.8 &#x3bc;m or less. The low-friction sliding member exhibits reduced friction coefficients between itself and mating members, without relying on the adsorption and reaction of additives, included in lubricants, to the amorphous hard carbon films.

Low-friction sliding member

A sliding film includes a solid lubricant, a binder resin, and a low-melting-point material. The binder resin is for holding the solid lubricant on a surface of a substrate, and exhibits a glass transition temperature. The low-melting-point material exhibits a melting point lower than the glass transition temperature of the binder resin. The low-melting-point material demonstrates a latent heat which can absorb frictional heat generated between sliding members, and accordingly retards the degradation of the binder resin. As a result, the sliding film produces high seizure resistance.

Sliding film, sliding member, composition for sliding film, sliding device, swash-plate type compressor, process for forming sliding film, and process for producing sliding member

This invention provides a covered member which possesses a high bond strength of a base material and a covering film, and has a smooth surface. The covered member comprises a base material and a covering film and the surface of the base material to be covered with the covering film is characterized by an uneven surface having projections with an average height in the range from 10 to 100 nm and an average width of not more than 300 nm. The uneven surface can be formed by ion impacting. A surface of a covering film formed on that is smooth since the unevenness of the surface is extremely fine.

Covered member and method of producing the same

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Nisshin, Japan

Hideo Tachikawa