Sony Corporation

Hideo Nagasaki

Tsuyoshi Inoue

Hajime Yagi

Katsuyuki Akutsu

Takashi Mizusawa

Tatsushiro Hirata

Yusuke Kajio

Kazutatsu Tokuyama

Tsutomu Mori

Shoichi Hayashi

Naruhiko Abe

Daisuke Tsukuda

Nobuo Hagiwara

A deposition mask with which position precision of a passage hole is improved and deposition can be conducted precisely and a manufacturing method thereof are provided. A mask body made of a metal thin film is fixed and tightly mounted on a frame body having an opening. The mask body has at least one pattern region including a plurality of passage holes for letting through a deposition material, a stress relaxation region including a plurality of fine holes provided at the periphery of the pattern region, and a holding region provided at the periphery of the stress relaxation region. The mask body is tightly mounted on the frame body at a holding region.

Deposition mask and manufacturing method thereof

A work holding device is intended for use in combination with a processing machine, such as an assembling apparatus, an industrial robot or a machine tool. The work holding device comprises a base plate (8), a slide base (9) supported for vertical movement on the base plate (8), a swivel head (10) supported for turning on the slide base (9), and a rotary table (11) supported on the swivel head for rotation about an axis perpendicular to the axis of turning of the swivel head. The slide base (9), the swivel head (10) and the rotary table (11) are controlled properly to set a work (12) held on the rotary table (11) in an optional position relative to the associated processing machine. The work holding device and the processing machine are controlled for synchronous operation by a single controller according to a control program.

Work holding device

Growing community of inventors

Tokyo, Japan

Hideo Nagasaki