Sumitomo Chemical Company, Limited

Kabushiki Kaisha Toshiba

Hideo Kusakabe

Hiroyuki Ogawa

Yoshizumi Sasaki

Ikuhiro Tamaru

Kazuyoshi Sugihara

Ichiro Mori

Mineo Gotou

Shinichi Saito

Jitsuo Kuroawa

Tooru Koike

Yuji Takigami

Atsushi Miyagaki

Kazuo Aikawa

Michio Orino

Jitsuo Kurokawa

Kazuya Aoi

In a charged beam drawing apparatus for drawing a desired pattern on a sample by deflecting a charged beam on the sample while continuously moving a stage on which the sample is placed, a mark having a line-and-space pattern, in which a plurality of heavy metal marks each having a width equal to a side of the charged beam are arranged with spaces each equal to the width between them, is formed on the sample. The charged beam is radiated onto the mark while the position of the beam is fixed, and at the same time the stage is continuously moved in the longitudinal direction of the mark, thereby detecting a reflected beam from the mark. On the basis of the signal of the detected reflected beam, a relative vibration during the continuous movement of the stage is measured. This makes it possible to measure the relative vibration produced by the continuous movement of the stage, resulting in an increase in drawing accuracy.

Charged beam drawing apparatus

A fluidized bed-type polymerization apparatus has an upper blowing equipment installed at a definite height in the fluidized bed area. Through the equipment, a part of the circulating gas and a part, or the whole, of the fresh feed material is blown, thereby to prevent the formation of lumps of polymer in the fluidized bed portion, owing to improved intermixing at the upper portion of the fluidized bed, as well as efficient heat-removal at that portion.

Process for gas phase polymerization

Apparatus for gas phase polymerization and method for operating the same

The data in a counter in which a tolerable displacement of a table during the drawing in a sub-field and a movement of the table are compared in comparator. When the table movement exceeds a predetermined tolerable displacement preset in circuit for table movement correction, a signal for interrupting the pattern drawing is transferred to a control section. The main deflection position and the correction data for minor deflection distortion are set anew by a computer. Then, drawing of the remaining patterns is restarted.

Method for drawing a pattern by charged beam and its apparatus

Method for drying poly(.alpha.-olefins) comprising contacting poly(.alpha.-olefins) having a content of hydrocarbon medium of 0.2 to 2% by weight with nitrogen gas having substantially no hydrocarbon medium and having a dew point of -10.degree. C. or lower in counterflow in a silo type through-flow drying apparatus whereby poly(.alpha.-olefins) having a content of the hydrocarbon medium of less than 0.2% by weight can be obtained.

Method for drying polyolefins

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Chiba, Japan

Hideo Kusakabe