Nippon Sheet Glass Company, Limited

Saint-gobain Vitrage

Saint-gobain Recherche

Taliq Corporation

Hideo Kawahara

Hirotsugu Nagayama

Masahiro Hirata

Harunobu Yoshida

Akihiro Hishinuma

Hiroaki Tada

Juichi Ino

Takuji Goda

Kazuo Takemura

Masato Hyohdou

Yasuhiro Saito

Yasuto Sakai

Jean-Claude Coulon

Nobuhiro Sakata

Masato Hyodo

Masaki Kitaoka

Patrick Lovera

Hisao Honda

Shigehito Deki

Eiji Mizushima

Yukihiro Kato

Yukihiro Katoh

Masakiyo Tonoike

Kunio Miyata

Masanaga Kikuzawa

Hiroaki Ida

Masao Misonou

Masao Minosou

Hironobu Yamamoto

Method for producing silicon dioxide film which prevents escape of Si

A light controlling device comprising a pair of substrates, a viscoelastic or elastic dispersing medium containing fine particles aligned in an approximately constant direction, and a way for applying a shear stress to the viscoelastic or elastic material. The device can control light transmission in non-stage by applying a shear stress to the viscoelastic or elastic material to incline the direction of the alignment of particles with respect to the incident light.

Light controlling device and process for controlling light transmission

A conductive glass with a coat constituted mainly of a potassium-contained stannic oxide applied on a glass substrate, wherein a film thickness of the coat constituted mainly of the stannic oxide comes within the range of 1 to 100 nm, a potassium concentration is 0.1 to 10.0 wt %, and a surface compression stress of the conductive glass is 30 to 100 kg/mm.sup.2. After the stannic oxide coat is formed on the glass substrate, it is brought into contact with a melted potassium nitrate to contain potassium in the glass substrate and the coat.

Method of manufacturing a conductive glass with high strength and wear

A method for forming a silicon dioxide film according to the present invention comprises steps of: (i) contacting a substrate with processing solution containing silicofluoric acid solution supersaturated with silicon dioxide, and (ii) forming the silicon dioxide film on the substrate; wherein organic colorant(s) is/are introduced into the silicon dioxide film by adding organic colorant(s) to the processing solution. According to the present invention, a silicon dioxide film containing organic colorant without defect such as air bubbles, or undecomposed raw material.

Method for manufacturing layer-built material with silicon dioxide film

A thin film capacitor having high performances, e.g. high frequency characteristics, heat resistance and dielectric strength, and capable of meeting demands for high integration and miniaturization of electronic devices, which comprises an electrically conductive substrate, a silica thin film formed on the substrate by bringing the substrate into contact with an aqueous solution of hydrosilicofluoric acid supersaturated with silica, and an electrically conductive film formed as an electrode on the silica thin film.

Thin film capacitor

A light controlling device having excellent controllability of light and solar energy transmission which comprises a suspension of anisotropic particles in an liquid dielectric medium and a pair of electrodes for applying an electric field to said suspension, and said anisotropic particles having an aspect ratio of at least 3.5 and comprising an inorganic titanium compound having an absorption coefficient of at least 5.times.10.sup.3 cm.sup.-1, especially a titanium compound of the formula: TiOxNy wherein 1.37.ltoreq.x.sup.+ y.ltoreq.1.95 and 0.15.ltoreq.y.ltoreq.0.92.

Electrically responsive light controlling device

A process for depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by heating a hydrosilicofluoric acid solution substantially saturated with silicon dioxide which has a temperature of not more than 0.degree. C., to a temperature of not less than 25.degree. C.

Process for depositing silicon dioxide films

A process for the distribution of a powder for coating glass, whereby a regular, homogeneous coating of uniform thickness is formed, wherein the powder is converted into a metal oxide or oxides upon contact with hot glass, which comprises spraying a powder onto said glass, wherein said powder comprises: (a) a composition which is capable of being converted into a metal oxide or oxides upon contact with hot glass, and (b) a water-repellent, anhydrous product having a base of finely-divided silica. The product with a base of finely-divided silica is added in the amount of about 0.5 to 5%, by weight, based on the total powder weight.

Distribution of powder for making coated glass

A method of depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by increasing the temperature of a hydrosilicofluoric acid solution substantially saturated with silicon dioxide.

Method of depositing a silicon dioxide film

A process for the distribution of a powder for coating glass, whereby a regular, homogeneous coating of uniform thickness is formed, wherein the powder is converted into a metal oxide or oxides upon contact with hot glass, which comprises spraying a powder onto said glass, wherein said powder comprises: (a) a composition which is capable of being converted into a metal oxide or oxides upon contact with hot glass, and (b) a water-repellent, anhydrous product having a base of finely-divided slica. The product with a base of finely-divided silica is added in the amount of about 0.5 to 5%, by weight, based on the total powder weight.

The invention relates to the production of transparent electric conductors. According to the invention, a doped tin oxide layer formed by CVD is heat-treated to improve its conductivity.

Production of a transparent electric conductor

An electromagnetic device comprising solid matrix layer, wherein micro-capsules containing suspension anisotropic particles are dispersed, and a means for applying electric field or magnetic field to the anisotropic particles. According to the present invention, not only range of transmittance of solar radiation can be much improved, but also a smart window of large scale having nonuniformity of thickness and nonuniformity of density of particles can be realized.

Electromagnetic device

A film of the oxide of a metal selected from the group consisting of Sn, Zr, In, V, Cr, Mn, Fe, Co, Ni, and Cu is deposited on the surface of a substrate by a method which comprises establishing contact between the substrate and a treating liquid containing fluorine and the metal selected as described above thereby having the oxide of the metal dissolved to supersaturation therein.

Method for production of oxide film

A signal light comprising a light source and a liquid crystal means. The liquid crystal means is disposed between the light source and a viewing area of the signal light for blocking and transmitting light according to a given electrical input. The signal light further includes means for energizing the light source when the liquid crystal means transmits light and for de-energizing the light source when the liquid crystal means blocks light.

Growing community of inventors

Mino, Japan

Hideo Kawahara