Panasonic Intellectual Property Management Co., Ltd.

Hideo Kanou

Atsushi Harikai

Noriyuki Matsubara

Mitsuru Hiroshima

Toshihiro Wada

Syouzou Watanabe

Provided is a plasma treatment method including: placing a substrate carrier holding a substrate on a stage; adjusting a distance between a cover and the stage to a first distance in which the cover covers a frame without coming into contact with the substrate carrier; performing a plasma treatment on the substrate placed on the stage after the adjusting of the distance; carrying the substrate together with the substrate carrier out from a reaction chamber after the performing of the plasma treatment; and removing an adhered substance adhered to the cover by generating plasma in the inside of the reaction chamber after the carrying of the substrate, in which the distance between the cover and the stage in the removing of the adhered substance is a second distance greater than the first distance.

Growing community of inventors

Osaka, Japan

Hideo Kanou