Mitsubishi Materials Corporation

Hideo Ito

Toshiyuki Ishii

Yuji Shimizu

An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the reaction passageway includes: a supply side passageway which is connected to the gas supply section at a central portion of the reaction vessel and flows the supply gas toward the outside while meandering in the reaction vessel; a return passageway which is connected to a downstream end of the supply side passageway and extends to the central portion of the reaction vessel; and a discharge side passageway that is disposed so as to be connected to a downstream end of the return passageway and to adjoin the supply side passageway of the central portion of the reaction vessel, the discharge side passageway being connected to the gas discharge section.

Apparatus for producing trichlorosilane

An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway.

Method for producing trichlorosilane

An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a storage container that stores the reaction vessel and the heating mechanism; a gas supply internal cylinder that supplies the supply gas in the reaction vessel; a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant.

An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism having a heater that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the heater is disposed in the center of the reaction vessel, and the reaction passageway is disposed in the periphery of the heater.

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Kuwana, Japan

Hideo Ito