Kabushiki Kaisha Toshiba

Ebara Corporation

Tokyo Shibaura Denki Kabushiki Kaisha

Hideo Ishihara

Mituo Kawai

Yoshiharu Fukasawa

Takenori Umeki

Takashi Ishigami

Noriaki Yagi

Takahiro Ohshita

Kazumi Shimotori

Harumitsu Saito

Noboru Kitamori

Yoshiharu Ochi

Masanori Kibata

Kazunori Yokosu

Shigeki Kajima

Satoshi Yamaguchi

Yasuhisa Oana

Takashi Yamanobe

Hideo Koizumi

Makoto Kikuchi

Katsuhiko Kawakita

Tatsuhiko Matsumoto

A high temperature heat-treating jig characterized by forming a tungsten layer or a tungsten alloy layer on the surface of a heat-resistant base to avoid discoloration and color shading during the heat treatment at a high temperature.

High temperature heat-treating jig

The present invention consists of a sputtering target wherein target pieces made of at least two different kinds of materials are compositely arrayed in a manner as to be divided into the respective materials, characterized by having at least one irregular erosion region which is defined as a region enclosed with a circle having an erosion width as its diameter, located at a region farthest from the center of gravity of the sputtering target within a region to be eroded in a curvilinear shape, the irregular erosion region being formed at least partly of target pieces made of at least two kinds of materials having either shapes or surface areas thereof different from those of the target pieces lying outside the irregular erosion region and are compositely arrayed in a manner as to be divided into the respective materials.

Sputtering target

A sputtering target divided into respective target elements of two or more types arranged as a composite on a substrate, is disclosed. A thin sheet whose constituent material comprises one or more of the constituent materials of the target elements, and whose constituent material includes at least one metal material, is interposed between said substrate and target elements.

The present invention is a sputtering target for formation of an alloy film, which comprises 15 to 50 atomic percent of molybdenum or tungsten, the remaining atomic percent of tantalum, and concomitant impurities, which can provide electrical wiring having very low specific resistance as well as excellent workability and stability, whereby high definition and high integration of various elements such as semiconductor devices can be achieved. In consequence, it is fair to say that this invention is industrially very useful.

Sputtering alloy target and method of producing an alloy film

Disclosed is a highly pure titanium which comprises containing not more than 200 ppm of oxygen; not more than 30 ppm each of elements consisting of iron, nickel and chromium, and not more than 0.1 ppm each of elements consisting of sodium and potassium. Disclosed is also a process for preparing the above highly pure titanium which comprises melting a crude titanium obtained by molten salt electrolysis, in a high vacuum of 5.times.10.sup.-5 mbar or less.

Highly pure titanium

Disclosed is a sputtering target which comprises a single block composed of one or more of metals prepared by a melting process or an alloy thereof; a combined block of the plural single blocks; or a combined block of the single blocks and silicon blocks; an average size of the crystal grains of the metal or the alloy being between 1 .mu.m and 1 mm.

Highly pure titanium and process for producing the same

A method for incinerating material is disclosed wherein a vertical thermal reactor of the fluidized bed type is employed, the reactor being generally a rectangular shape in a horizontal section and having opposed side walls. Fluidizing medium is subjected to different mass flow at the center portion and the side portions so that relatively strong side fluidized beds are formed adjacent the side walls and a relatively weak fluidized bed is formed at the center sandwiched by the side fluidized beds free of any obstructions therebetween. The center fluidized bed tends to descend relative to the side fluidized beds which are deflected at the upper portions thereof, respectively toward the center so that the fluidized medium circulates from the lower part of the center fluidized bed to the lower parts of the side fluidized beds and from the upper parts of the side fluidized beds towards the upper part of the center fluidized bed. The material to be thermally processed is charged to the upper part of the center fluidized bed and pre-shredding of the material is not required.

Method for incinerating material

A molybdenum-based alloy improved in mechanical strength and hot workability, which consists of 0.01 to 5.0% by weight of vanadium, 10 to 100 ppm of boron, 10 to 1,000 ppm of carbon, and the balance of molybdenum.

Molybdenum-based alloy

A fluidized bed type thermal reactor having a furnace housing wherein there is substantially no partition wall and adapted to generate a downwardly descending moving bed portion and whirling fluidized bed portions at opposite lateral sides of the moving bed, respectively, whereby pre-shredding or crushing of material to be charged into the furnace is made substantially unnecessary. The reactor is provided with a unique feeder for charging the material so that the incombustible items the size of which is not suitable to be charged into the furnace are rejected by reversing the feeding direction of the feeder when the presence of such items is sensed.

Growing community of inventors

Yokohama, Japan

Hideo Ishihara