Nuflare Technology, Inc.

Kabushiki Kaisha Toshiba

Hideo Inoue

Ryoichi Yoshikawa

Hiroshi Matsumoto

Tomohiro Iijima

Munehiro Ogasawara

Yasuo Kato

Hayato Kimura

Noriaki Nakayamada

Ryoh Kawana

Kei Hasegawa

Yoshiaki Onimaru

Takayuki Abe

Takashi Saito

Toru Tojo

Takashi Kamikubo

Jun Yashima

Akihito Anpo

Hirohito Anze

Seiji Wake

Susumu Oogi

Yoshiaki Hattori

Mitsuko Shimizu

Hironori Mizoguchi

A multiple charged particle writing method includes performing a tracking operation by shifting the main deflection position of multiple beams using charged particle beams in the direction of stage movement so that the main deflection position of the multiple beams follows the stage movement while a predetermined number of beam shots of the multiple beams are performed, and shifting the sub deflection position of the multiple beams so that each beam of the multiple beams straddles rectangular regions among plural rectangular regions obtained by dividing a writing region of a target object into meshes by the pitch size between beams of the multiple beams, and the each beam is applied to a different position in each of the rectangular regions straddled, and applying a predetermined number of shots per beam using plural beams in the multiple beams to each of the plural rectangular regions, during the tracking operation.

Multiple charged particle beam writing method and apparatus using beams for straddling regions

According to one aspect of the present invention, a charged particle beam writing apparatus includes correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting a figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern; correction figure pattern data conversion circuitry configured to convert the pattern data of the correction figure pattern into correction figure pattern pixel data defining a value corresponding to a dose for the each pixel, based on pixel setting common to that of the writing pattern pixel data; and combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data.

Charged particle beam writing apparatus and charged particle beam writing method

A multiple charged particle beam writing apparatus includes a defective pattern data generation circuitry configured to generate defective pattern data of a defective pattern having a shape of the defective region in the writing region; a reverse pattern data generation circuitry configured to generate reverse pattern data by reversing the defective pattern data; a combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding a value defined in a reverse pattern pixel data and a value defined in a writing pattern pixel data; and a writing mechanism configured to perform multiple writing, using multiple charged particle beams, on the target object such that the each pixel is irradiated with a beam of a dose corresponding to a value defined in the combined-value pixel data.

Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

A multiple charged particle beam writing apparatus includes a rotatable shaping aperture array substrate, including plural openings, to form/shape multiple beams by letting portions of a charged particle beam individually pass through the plural openings, a data rotation correction circuitry to read writing data from a storage device, and generate pattern data, in which the entire figure pattern has been reversely rotated against a rotational deviation direction of an aperture array image by a rotational deviation amount of the aperture array image, using information on the rotational deviation amount of the aperture array image of the multiple beams on the target object caused by a residual error of rotation adjustment of the shaping aperture array substrate, and a blanking aperture array mechanism, rotatable with the shaping aperture array substrate, to provide individual blanking control of the multiple beams, based on the pattern data of the figure pattern reversely rotated.

A charged particle beam writing apparatus includes a division/distribution processing unit to divide and distribute processed data into data groups each having an approximately equal data amount respectively, transmitting units to transmit the processed data of the groups such that processed data is transmitted in descending order with respect to order of writing processing for each data group and the groups are transmitted in parallel, memories to store the processed data of the groups such that each of the memories stores processed data of each different one of the groups, a writing order data output unit to output them, regardless of data group and in order of writing processing, and a writing unit to write a pattern on a target workpiece with a charged particle beam, based on the processed data output in the order of writing processing.

A drawing device according to an embodiment includes: a stage configured to be capable of having a processing target mounted thereon; an aperture member including a plurality of apertures corresponding to a plurality of beams irradiated to the processing target; a data generator configured to generate gradation data indicating irradiation time data with n bits (n is a positive integer) with respect to positions of respective coordinates of the beams; a calculator configured to perform a logical addition operation of the gradation data of the respective positions of the coordinates; and a controller configured to control the aperture member based on the gradation data and a result of the logical addition operation.

Drawing device and drawing method

A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Multi charged particle beam writing method and multi charged particle beam writing apparatus

According to one embodiment, in a multi-charged particle beam writing apparatus, a blanking plate includes a plurality of first buffers connected in series, second buffers in a plurality of stages connected in series between the first buffer and a blanker, and an error detection processing circuitry performing error detection on data stored in the first buffer and the second buffers. The blanking control data transfers to the corresponding blanker via the first buffer and the second buffers. In a case where the error detection processing circuitry detects an error, the control processing circuitry retransmits the blanking control data to the blanking plate with regard to a shot having the error detected therein and a shot which comes, in a shot order, after the shot having the error detected therein.

Multi-charged particle beam writing apparatus and multi-charged particle beam writing method

A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

Multi charged particle beam writing apparatus and multi charged particle beam writing method

In one embodiment, a multi charged particle beam writing apparatus includes processing circuitry that is programmed to perform the function of a data region determination part determining a data region based on boundaries of pixels obtained by dividing a writing area of a substrate into mesh-shaped regions, an irradiation range of multiple charged particle beams, and boundaries of stripe segments obtained by dividing the writing area into segments having a predetermined width such that the segments are arranged in a predetermined direction, a deflection coordinate adjustment part adjusting deflection coordinates of the multiple charged particle beams such that the boundaries of the pixels are mapped to a boundary of the irradiation range, and a correction part calculating a corrected dose of each beam of the multiple charged particle beams by distributing, based on a positional relationship between the beam and pixels in the data region, a dose of the beam corresponding to a pixel in the data region calculated based on write data to one or more beams, and adding doses distributed to the beam, and a writing mechanism, including a charged particle beam source, a deflector, and a stage on which a target object is placed, and the writing mechanism deflecting the multiple charged particle beams based on the adjusted deflection coordinates and applying the beams each having the corrected dose to write a pattern.

A multi charged particle beam writing apparatus includes a deflector to collectively deflect each beam in an 'on' state, by tracking control in such a way as to follow stage movement, an obtaining processing circuitry to obtain a deviation amount of an irradiation position of each beam of multi-beams depending on a tracking amount of the tracking control, a correction coefficient calculation processing circuitry to calculate a correction coefficient for correcting the deviation amount of the irradiation position depending on the tracking amount, for each beam of the multi-beams and for each irradiation position, a shot data generation processing circuitry to generate shot data where deviation of an irradiation position of each beam of multi-beams depending on a tracking amount is to be corrected using a correction coefficient, for each tracking operation, and a deflection control processing circuitry to control plural blankers, based on the shot data.

A multi charged particle beam writing apparatus includes a dividing circuitry to divide first irradiation time data into k pieces of second irradiation time data, where each of the k pieces of second irradiation time data has a different number of bits and the total of different numbers of bits is n-bits, in multi-pass writing of k or more passes by using multi charged particle beams, a data transmission circuitry to transmit, for each of k passes, corresponding second irradiation time data, for a beam concerned in multi charged particle beams, a resolution information transmission circuitry to transmit, for each of k passes, corresponding resolution information, and an irradiation time calculation circuitry to calculate an irradiation time of a corresponding beam in the multi charged particle beams of a pass concerned by using input second irradiation time data and resolution information.

A shot data generation method includes inputting writing data for writing a pattern on a target object with multi charged particle beams, and generating shot data for each beam of the multi charged particle beams by converting the writing data and using one of a first code indicating a first irradiation time period having been set beforehand, a second code indicating an irradiation time period being zero, and a third code indicating neither the first irradiation time period nor the irradiation time period being zero.

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Miura-gun, Japan

Hideo Inoue