Gigaphoton Inc.

Komatsu Corporation

Gigaphonton Inc.

Hideo Hoshino

Tamotsu Abe

Osamu Wakabayashi

Akira Endo

Kouji Kakizaki

Masato Moriya

Hakaru Mizoguchi

Hiroshi Someya

Takashi Suganuma

Yukio Watanabe

Akira Sumitani

Hiroshi Komori

Hideyuki Hayashi

Michio Shinozaki

Shinji Nagai

Tatsuya Yanagida

Krzysztof Nowak

Takayuki Yabu

Yoshifumi Ueno

Tsukasa Hori

Toshihiro Nishisaka

Takanobu Ishihara

Takeshi Asayama

Georg Soumagne

Tatsuya Ariga

Masahiro Inoue

Yutaka Shiraishi

Takashi Onose

Yasufumi Kawasuji

Fumio Iwamoto

Hirokazu Hosoda

Satoshi Tanaka

Yoshiaki Kurosawa

Akiyoshi Suzuki

Youichi Sasaki

Hiroaki Nakarai

Yousuke Imai

Tomohide Ichinose

Provided is a laser annealing apparatus causing laser light to be radiated to processing receiving areas arranged, out of a first direction and a second direction perpendicular to the first direction, along at least the second direction and move a batch radiation area and a workpiece in the first direction, and the laser annealing apparatus includes an energy density measuring apparatus measuring the energy density at, out of first and second ends of the batch radiation area in the second direction, at least the second end, an energy density adjusting apparatus adjusting the energy density at the first end, and a controller controlling the energy density adjusting apparatus. The energy density at the first end when (N+1)-th scanning is performed is so adjusted that the energy density at the first end in an (N+1)-th scan area approaches the energy density at the second end in the N-th scan area.

Laser annealing apparatus and method for manufacturing electronic device

A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.

Filter and target supply apparatus

A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates extreme-ultraviolet-light. The target image-capture device may include a droplet detector configured to detect passage of a droplet output as the target, and output a detection signal, an illumination light source, an image capturing element, a shutter device, and a controller configured to output, to the image capturing element, an exposure signal allowing the image capturing element to perform image capturing, and output, to the shutter device, a shutter open/close signal allowing a shutter to perform an open and close operation upon input of the detection signal. The controller may output the shutter open/close signal to the shutter device to make the shutter closed during when the droplet is irradiated with the laser light so that the plasma is generated.

Target image-capture device, extreme-ultraviolet-light generation device, and extreme-ultraviolet-light generation system

A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.

Laser apparatus and extreme ultraviolet light generation system

A laser apparatus may include, a first frame and a second frame, a sleeve through-hole provided in the second frame, a sleeve insertion hole provided in the first frame, a bolt, a positioning sleeve that is formed in an approximately cylindrical shape into which the bolt can be inserted and that positions the first frame and the second frame by passing through the sleeve through-hole and being inserted into the sleeve insertion hole, a nut that is provided in the first frame and into which the bolt is screwed, and a fall prevention unit that is provided in the second frame and that prevents the bolt and the positioning sleeve from falling.

Laser apparatus and laser apparatus manufacturing method

There may be provided a laser amplifier including: a chamber containing a laser medium; a first window provided on the chamber, and configured to allow a laser light beam inputted from outside of the chamber to enter the chamber; an excitation unit configured to amplify, by exciting the laser medium, the laser light beam that has entered the chamber; a second window provided on the chamber, and configured to allow the laser light beam that has been amplified by the excitation unit to exit from the chamber to the outside; a mirror provided on a laser light path between the first window and the second window; and a wavelength selection film provided on one or more of the first window, the second window, and the mirror, and configured to suppress propagation of light beams of one or more suppression target wavelengths different from a desired wavelength.

Laser amplifier, laser apparatus, and extreme ultraviolet light generating system

An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Optical device, laser apparatus, and extreme ultraviolet light generation system

A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.

Laser beam output control with optical shutter

A wavelength converter may include a non-linear optical crystal, and an optical member bonded to a region of a contact surface of the non-linear optical crystal, located a predetermined distance or more on an inner side from an outer periphery of the contact surface. The wavelength converter may receive laser light and stably output light having a wavelength different from that of the laser light.

Wavelength converter, wavelength converting device, solid state laser device, and laser system

A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.

Laser apparatus, extreme ultraviolet light generation system, and method for generating laser beam

A laser device, which includes an oscillator unit having a rectangular-solid-shaped housing containing a laser oscillator for generating and outputting a laser light; an amplifier unit having a rectangular-solid-shaped housing containing an amplifier that receives and amplifies the laser light to output; and, a group of optical elements including optical elements provided on a laser light path, wherein the laser device includes one or more amplifier units, and the oscillator and the amplifier units are arranged such that surfaces having a wide area other than a surface having a smallest area of a housing of the oscillator unit and a housing of at least one amplifier unit are next to and face each other, or such that surfaces having a wide area other than a surface having a smallest area of a housing of at least two amplifier units are next to and face each other.

Laser device with optical element module on separate plate

A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.

Temperature controller for gas laser

A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.

Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus

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Hiratsuka, Japan

Hideo Hoshino