Hitachi, Ltd.

Hidenori Yamaguchi

Hiroyuki Takahashi

Genya Matsuoka

Hiroyoshi Ando

Teruo Iwasaki

Norio Hasegawa

Yoshitada Oshida

Shigeo Moriyama

Fumio Murai

Hiroshi Shiraishi

Tatsuo Harada

Toshiaki Kita

Toshio Kaneko

Toshio Sakamizu

Katsuhiro Kawasaki

In forming a resist pattern by forming a resist film containing an acid generator on a spin on glass film or a silicon resin film and subsequent exposure of light, an inhomogeneous distribution of an acid in the resist film caused by the spin on glass film or the silicon resin film is remedied by adding an acid generator beforehand into the spin on glass film or the silicon resin film or by using an organic polymer containing an acid generator. As a result, a profile defect in a cross section of the resist pattern caused by inhomogeneous acid distribution is prevented and the resist pattern has a rectangular cross-sectional shape.

Pattern forming method

A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.

Lithographic apparatus and method

An electron beam lithography apparatus, comprising an electron beam source for irradiating an electron beam on a specimen surface, a deflectional controller of the electron beam, a focal controller of the electron beam on the specimen surface, a light source which irradiates two monochromatic lights on the surface having wavelengths which are different a half thereof each other, a signal processor for obtaining correction values in a height direction of the beam based on the reflected lights from the surface, and a means for adjusting the focal controller according to the correction values in the height direction. As the wavelengths of the two monochromatic lights on the surface are different in a half wavelength each other, an interference caused by a photo-resist on the specimen is prevented.

Electron beam lithography system

A tool for ruling grating grooves is reciprocated on a diffraction grating blank with the tool being restrained within a plane inclined at an arbitrary angle relative to a plane lying in contact with one point on a spherical concave of the diffraction grating blank. Translation for a variable pitch-groove spacing which changes as a function of the groove number or groove position is imparted to the diffraction grating blank in interlocking relationship with the reciprocation, thereby mechanically ruling the desired sphere of the grating blank with the grating grooves, whereby a concave diffraction grating which forms diffracted light of a specific wavelength into a completely stigmatic image at high diffraction efficiency can be manufactured.

Concave diffraction grating and a manufacturing method thereof

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Kokubunji, Japan

Hidenori Yamaguchi