Fujifilm Corporation

Fujitsu Corporation

Yamaha Hatsudoki Kabushiki Kaisha

Fujitsu Semiconductor Limited

Yamaha Motor Power Products Kabushiki Kaisha

Hidenori Takahashi

Michihiro Shirakawa

Shuhei Yamaguchi

Keita Kato

Tomotaka Tsuchimura

Hideaki Tsubaki

Takayuki Ito

Shuji Hirano

Kaoru Iwato

Kei Yamamoto

Shohei Kataoka

Fumihiro Yoshino

Sou Kamimura

Atsushi Nakamura

Shoichi Saitoh

Tadahiro Odani

Terumasa Haneda

Takeshi Inasaki

Toshihiko Suzuki

Junichi Ito

Toru Fujimori

Takashi Kawashima

Toru Tsuchihashi

Kana Fujii

Yuichi Ogawa

Katsuhiro Yamashita

Shuichiro Osada

Emi Cho

Kosuke Koshijima

Naoyuki Nishikawa

Toshihide Ezoe

Kenji Wada

Yoshinori Taguchi

Naoya Shibata

Kazuhiro Fujimaki

Yoichi Hosoya

Toshihiro Usa

Takashi Katoh

Koji Shirakawa

Toshihide Aoshima

Hideaki Ito

Norihide Shimohara

Hisato Nagase

Seiichi Hitomi

Takeshi Kawabata

Kyohei Arayama

Fumiyuki Nishiyama

Tokuju Oikawa

Atsushi Uchida

Naohiro Tango

Kenji Sugiyama

Hirotaka Takishita

Shigekazu Suzuki

Masanobu Yamamoto

Toshiya Takahashi

Satoru Murayama

Yousuke Miyashita

Toshiyuki Yoshida

Seongmu Bak

Hiroshi Tamaoki

Tomohiro Kodama

Yuki Nara

Satoru Akimoto

Katsuhiro Nishimaki

Yuuji Hanaoka

Koreshige Ito

Koichi Sugihara

Makoto Yokokura

Yasufumi Oishi

Takayuki Kusano

Haruhiko Yoshino

Tetsu Kamosaki

Shinichi Kajiya

Hisano Osanai

Keisuke Matsumoto

A photosensitive resin composition including an ethylenically unsaturated compound, a resin having a polarity that increases by the action of an acid, and metal atoms, in which a total content of the metal atoms is from 1 ppt to 30 ppb with respect to a total mass of the photosensitive resin composition, and a content of the ethylenically unsaturated compound is from 0.0001% by mass to 1% by mass with respect to the total mass of the photosensitive resin composition, and a method for producing the same; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the photosensitive resin composition.

Photosensitive resin composition, method for producing the same, resist film, pattern forming method, and method for manufacturing electronic device

A composition includes a metal particle and a resin and has a wavelength band A having a wavelength band width of 1 &#x3bc;m or more in a wavelength range of 1 to 14 &#x3bc;m and a wavelength band B having a lower absorbance than the wavelength band A and having a wavelength band width of 1 &#x3bc;m or more, and a ratio A/Bbetween a minimum value Aof an absorbance of the wavelength band A and a maximum value Bof an absorbance of the wavelength band B is 3 or more.

Composition, formed body, laminate, far infrared ray transmitting filter, solid-state imaging element, infrared camera, and infrared sensor

A curable composition which can be used to produce a cured film that does not easily allow a near infrared-absorbing pigment to be eluted even when the cured film is immersed in a solvent is provided. A cured film, a near infrared cut filter, a camera module, and a method for manufacturing a camera module are also provided. The curable composition includes: a near infrared-absorbing pigment (A) and a curable compound (B) having one or more atoms or groups selected from a fluorine atom, a silicon atom, a linear alkyl group having 8 or more carbon atoms, and a branched alkyl group having 3 or more carbon atoms.

Curable composition, cured film, near infrared cut filter, camera module and method for manufacturing camera module

A composition includes at least one of particles having an average primary particle diameter of 50 to 150 nm or particles having an average major axis length of 50 to 150 nm, and a resin, in which the composition has an L* in an L*a*b* color space of CIE 1976 of 35 to 75 in a case of forming a film with a thickness of 3 &#x3bc;m using the composition. A film; a cured film; an optical sensor; and a method for producing a film each use the composition.

Composition, film, cured film, optical sensor, and method for producing film

Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.

Pattern forming method and actinic-ray- or radiation-sensitive resin composition

A near-infrared-absorbing composition includes a copper compound and a compound having a partial structure represented by Formula (1) described below and the content of the copper compound is in a range of 3&#xd7;10mol to 1 mol in relation to 1 g of the compound having the partial structure represented by Formula (1) described below, 

Near-infrared-absorbing composition, near-infrared cut-off filter using same, camera module, and manufacturing method therefor

A storage control device includes a first storage device and a processor. The first storage device stores management information used for managing a variable area of storage regions of a second storage device in a storage apparatus. Each storage region is allocated to a main area or a spare area. The variable area includes storage regions allocated to the spare area and allocatable to the main area. The processor acquires, from the storage apparatus, information on numbers of times of Read processing on the second storage device and numbers of times of Write processing on the second storage device, and notifies the storage apparatus, when a number of times of Read processing on the second storage device within a predetermined time period is larger than a predetermined threshold, of a request for allocating a first portion of the variable area to the main area on basis of the management information.

Storage control device and storage system

An object of the present invention is to provide a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining strong near-infrared shielding properties when a cured film is produced. The near-infrared-absorbing composition of the present invention includes a copper complex obtained by reacting two or more kinds of sulfonic acids represented by General Formula (I) described below or salts thereof with a copper component and a solvent. 

Near-infrared-absorbing composition, near-infrared cut-off filter using same, manufacturing method therefor, camera module, and manufacturing method therefor

Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film.

Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith

A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin  composition, resist film, method for manufacturing electronic device, and electronic device

The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (B) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film using a KrF excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tone pattern by developing the exposed film using a developer which includes an organic solvent.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device

A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern. 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern. 

There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (A) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.

Pattern forming method, actinic ray-sensitive or radiation-sensitive composition used therein, resist film, manufacturing method of electronic device using the same, and electronic device

A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

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Shizuoka, Japan

Hidenori Takahashi