Mitsubishi Denki Kabushiki Kaisha

Hidenobu Murakami

Hiroaki Tobuse

Yoshio Yamane

Ryo Suzuki

Hiroshi Koizumi

Masato Saito

Takahisa Nagayama

Kazuo Yoshida

Yoshimi Kinoshita

Kazuhiko Noguchi

Tetsuya Shiroishi

Seiji Yasunaga

Takashi Ishii

Yasushi Hisaoka

Koichi Sakurai

Naomitsu Fujishita

Masashi Kamio

Kouichi Sakurai

Image display apparatus

An inspection method and an inspection apparatus for the component members of the cathode-ray tube are disclosed. An inspection apparatus composed of normal members other than an object of inspection is prepared at the time of inspecting the phosphor screen of the screen panel, the electron gun or the shadow-mask constituting the cathode-ray tube. In advanced to assembling the cathode-ray tube, the object of inspection is mounted on the inspection apparatus, so that the conformance or rejection of the object of inspection is decided from the illuminated condition of the phosphor screen by irradiating electron beams thereon.

Method of inspection for cathode-ray tube component members and

The present invention aims to extract a large electron beam and extend the service life of an electron source by effectively radiating an electron beam with low energy from a plasma chamber toward an ion extraction port, and optimally neutralizing space charges of ions in the vicinity of the ion extraction port. An electron source is installed behind a plasma chamber to control an extraction power supply, an electron accelerating power supply, and a lens power supply. Thereby, an electron beam is extracted from the power source, and accelerated. Then, the electron beam is carried through an electric field lens at a high speed, decelerated in the vicinity of the plasma chamber, then converged to radiate toward the ion extraction port. An aperture is installed at a crossover point of the electron beam to diminish backward flow of ionic gas from the plasma chamber to the electron source.

Ion source having plasma chamber, an electron source, and a plasma power

A flat display device includes no exposed part of an insulated substrate on the inner wall of electron pass holes for attaining a high intensity of a display screen, high operational stability of the display screen, and having a simple structure for manufacturing it easily. In a control electrode, resistive films are formed on the exposed part of an insulated body. When the electrons pass through electron pass holes, electron beams are controlled without charging the insulated substrate by the electrons.

Flat display device

Printing pattern information from a printing pattern CAD is converted and output as deflection scanning data for the X-axis and the Y-axis by a deflection scanning data generating means. An electron beam deflection scanning means executes deflection scanning by an electron beam on a circuit printing base on the basis of the output deflection scanning data. The printing pattern irradiated with the electron beam is input to a bit map memory by dots which correspond to the points which are irradiated with the electron beam. A radiation control means can ascertain whether or not the point which is to be irradiated with the electron beam has already been subjected to beam irradiation at real time by consecutively reading out the dot information in the bit map memory at the address corresponding to the deflection scanning data. If there is no dot, a dot is written in the bit map memory simultaneously with beam irradiation, while if there is a dot, a blanking means outputs a control signal for cutting off the electron beam. Thus, overlap in printing pattern is detected at real time, thereby ensuring the avoidance of multiple beam radiation, namely, multiple exposure.

Electron beam direct printing apparatus

A feedback signal of a beam accelerating voltage, which is input into a feedback control system is fixed at a predetermined value corresponding to a signal under the condition before generation of arcing, when the arcing is generated, and thereafter, the fixed feedback signal is released to continue a feedback control.

Control system for a charged particle beam apparatus

Growing community of inventors

Amagasaki, Japan

Hidenobu Murakami