Toppan Printing Co., Ltd.

Adv Antest Corporation

Hidemitsu Hakii

Masashi Kawashita

Isao Yonekura

Tsutomu Murakawa

Yukari Oda

Tomoya Uchida

A display is provided with a periodic structure that is dielectric and includes a support and a plurality of periodic elements. A plurality of periodic elements is arranged on a reference plane in a two-dimensional lattice form having a sub-wavelength period and are either convexities projected or concavities recessed in the reference plane. A metal layer is disposed on a surface of the periodic structure. The surface corresponds to a plane including a region of the reference plane surrounding the individual periodic elements and surfaces of the periodic elements. The metal layer's profile conforms to a surface profile of the periodic structure. The plurality of periodic elements have an interval therebetween in a first direction in which the plurality of periodic elements are arranged in a two-dimensional lattice form. The interval is different from an interval between the periodic elements in a second direction intersecting the first direction.

Display having sub-wavelength polygonal periodic elements

An optical device comprises a support having a reference plane, and a dielectric periodic structure including a plurality of periodic elements which are arranged, on the reference plane, in a two-dimensional lattice having a sub-wavelength spacing and are either projections projecting from the reference plane or recesses depressed from the reference plane. The optical device further includes a metal layer, which is positioned on a surface of the periodic structure including a region of the reference plane surrounding the individual periodic elements and the surfaces of the periodic elements and which has a shape that follows the surface profile of the periodic structure.

Optical device, display body, device provided with a display body, optical filter, and method for manufacturing an optical device

A microstructure inspection method which inspects an angle of a sidewall of a sample microstructure pattern, the method including: taking SEM photographs of the sample microstructure pattern under plural SEM conditions; measuring a width of a white band at an edge portion of the sample microstructure pattern in the SEM photographs; and calculating the angle of the sidewall of the sample microstructure pattern on the basis of an amount of change in the width of the white band due to the change between the plural SEM conditions.

Microstructure inspection method, microstructure inspection apparatus, and microstructure inspection program

An electron beam is irradiated on an observation region of a sample surface. An image (SEM image) is acquired based on a detection signal of secondary electrons from a detector disposed obliquely above the observation region. A length of a shadow of a pattern appearing in the image is detected. Then, a height H of the pattern is calculated by a formula H=L&#xd7;tan &#x3b8; on the basis of the detected length L of the shadow and an apparent angle &#x3b8; of the detector to the sample surface obtained in advance. An intensity distribution of the secondary electrons on a line orthogonal to an edge of the pattern is extracted, and the length L of the shadow of the pattern is obtained as a distance between two points where a recess portion of the intensity distribution intersects a predetermined threshold.

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Tokyo, Japan

Hidemitsu Hakii