Mitsui Toatsu Chemicals, Incorporated

Hidemi Takenouchi

Sadao Kobayashi

Nobuhiro Fukuda

Kenji Miyachi

Takayuki Teramoto

Yoji Kawahara

A method for forming a dihydride rich amorphous silicon semiconductor film suitable for use as a window material of solar cells only from a silicon material, which comprises decomposing a gaseous mixture composed of disilane, a dopant capable of imparting p-type electrical conductivity and a diluent gas by applying a glow discharge energy, and thereby forming a semiconductor film having an optical band gap of at least 1.8 eV, preferably more than 1.9 eV, on a substrate.

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Yokohama, Japan

Hidemi Takenouchi