Hitachi, Ltd.

Hitachi Ulsi Systems Co., Ltd.

Other

National Institute of Advanced Industrial Science and Technology

Hitachi High-tech Corporation

Hitachi-science Systems, Ltd.

Hidemi Koike

Satoshi Tomimatsu

Kaoru Umemura

Muneyuki Fukuda

Hiroyasu Shichi

Hideo Kashima

Mitsuo Tokuda

Tohru Ishitani

Yasuhiro Mitsui

Noriyuki Sakudo

Katsumi Tokiguchi

Akira Shimase

Yuichi Hamamura

Osami Okada

Eiichi Seya

Aritoshi Sugimoto

Junzou Azuma

Isamu Sekihara

Junzo Azuma

Shigeto Isakozawa

Susumu Ozasa

Ichiro Kanomata

Michinobu Mizumura

Ken Ninomiya

Yasuhiro Koizumi

Motohide Ukiana

Norimasa Nishimura

Mitsugu Sato

Keizo Suzuki

Kensuke Amemiya

Hajime Yamazaki

Mikio Ichihashi

Sadayuki Okudaira

Shigeru Nishimatsu

Masakazu Sugaya

Shunroku Taya

Takayoshi Seki

Ryuichi Funatsu

Yuji Sato

Hiroshi Hirose

Isao Ochiai

Shinjiro Katagiri

Katsunobu Abe

Kenichi Hirami

Mitsuo Komatsu

Kazuhiro Fujii

Tamio Tanikawa

Humihiko Nakashima

Mitsunori Komatsumoto

Norio Saito

Eriko Otsu

Kazuhiro Morita

Uneven wear causes degradation of the individual parts of a syringe pump. Specifically, a seal piece composed of a soft material is easily damaged by uneven wear. To solve this problem, an automatic analysis device has a syringe pump that feeds and aspirates a liquid into and from a dispensing unit. The syringe pump has a syringe tube that stores a liquid, a plunger that moves up and down in the syringe tube, a plunger upper pressing component that contacts the plunger, a motive force transmitting part that transmits motive force to the plunger via the plunger upper pressing component, and a plunger lower pressing component that contacts the motive force transmitting part. The plunger upper pressing component and the motive force transmitting part make point contact with each other, and the motive force transmitting part and the plunger lower pressing component make point contact with each other.

Automatic analysis device with syringe pump

A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

Method and apparatus for specimen fabrication

An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

Method and apparatus for processing a micro sample

Method and apparatus for processing a microsample

A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow () appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.

Probe driving method, and probe apparatus

Provision of a 3-DOF micro manipulator easy to operate and capable of executing accurate positioning, wherein the link mechanisms of the micro manipulator whose main operation is parallel 3-DOF operation are implemented by cutting, folding, and moding a sheet of metal plate. Base and end effector are connected by three link mechanisms. The three link mechanisms are manufactured by cutting and folding a flexible plate material, and are equipped with plate-like arm portions each having a spread in the axially peripheral direction of the end effector, with hinge portions that are formed longitudinally across each arm portion in order to function as revolving joints R, and with a hinge portion also formed at the middle position of the arm portion in order to function as revolving joints R. Also, a parallelogrammatic link is formed between one longitudinal end of the arm portion and the middle portion thereof in order to function as a prismatic joint pair P.

Micro manipulator

Disconnection defects, short-circuit defects and the like in wiring patterns of submicron sizes within TEGs (a square of 1 to 2.5 mm for each) numerously arranged in a large chip (a square of 20 to 25 mm) can be inspected with respect to all the TEGs, with good operability, high reliability and high efficiency. A conductor probe for applying voltage to the wiring patterns by mechanical contact is composed of synchronous type conductor probe that synchronizes with movement of a sample stage (), and fixed type conductor probe means () that is relatively fixed to an FIB generator (). Positions of probe tips are superimposed to an SIM image and displayed on a display unit ().

Apparatus for inspecting defects of devices and method of inspecting defects

Growing community of inventors

Hitachinaka, Japan

Hidemi Koike