Fujifilm Corporation

Udc Ireland Limited

Hideki Yasuda

Masayuki Naya

Ryou Matsuno

Yoshihisa Usami

Wataru Sotoyama

Koji Takaku

Shogo Yamazoe

Shinya Hakuta

Masashi Ono

Yuichiro Itai

Takeharu Tani

Naoyuki Hayashi

Akihiko Ohtsu

Tadashi Kasamatsu

Kenichi Umeda

Seigo Nakamura

Tatsuya Yoshihiro

Ryo Matsuno

Takahiko Ichiki

Tasuku Satoh

Motoi Harada

Koki Takahashi

Kazuhiro Yokoi

Yohei Takahashi

Ichihiko Hashimoto

An electromagnetic shielding member () includes a substrate () having a three-dimensional shape, and a conductive layer member () that is disposed on the substrate () and reflects an electromagnetic wave in a wavelength-selective manner.

Electromagnetic shielding member

A waveguide structure includes at least one transmission line and at least one conductive pattern layer. At least a portion of the transmission line and at least a portion of the conductive pattern layer overlap each other as observed from a surface side of the conductive pattern layer. A surface electrical resistance value of the conductive pattern layer is in a range of 0.005Ω/□ to 30Ω/□.

Waveguide structure and method for manufacturing waveguide structure

Provided are semiconductor particles including a Group 12-16 semiconductor including a Group 12 element and a Group 16 element, a Group 13-15 semiconductor including a Group 13 element and a Group 15 element, or a Group 14 semiconductor including a Group 14 element, the semiconductor particles having a plasma frequency of 1.7&#xd7;10rad/s to 4.7&#xd7;10rad/s and a maximum length of 1 nm to 2,000 nm; and a dispersion, a film, an optical filter, a building member, or a radiant cooling device, in all of which the semiconductor particles are used.

Semiconductor particles, dispersion, film, optical filter, building member, and radiant cooling device

Provided is a multilayer structure including a radiator, a base material layer that includes a region forming an interface in an internal structure, and a first air layer that is provided between the radiator and the base material layer, in which a far-infrared transmittance B of the base material layer and a solar light reflectance A of the multilayer structure satisfy B/(100&#x2212;A)&#x3e;7, and a solar light reflectance C of the base material layer is 30% or more.

Multilayer structure

The present disclosure provides a polyolefin film including a fibrous polyolefin having an average diameter of 0.1 &#x3bc;m or more and less than 1.0 &#x3bc;m, wherein the polyolefin film has a connected-void structure, has a void ratio a of 50% to 90%, has a thickness d in &#x3bc;m, which satisfies, together with the void ratio a, a relation of 40&#x2264;(d&#xd7;(100&#x2212;a)/100)&#x2264;200, and is used as a radiative cooling film, and a radiative cooling structure body including the polyolefin film.

Polyolefin film and radiative cooling structure body

Provided are a high refractive index film including a high refractive index layer including a binder and flat metal particles, in which a value obtained by dividing an average particle diameter of the flat metal particles by an average thickness is 3 or more, a main plane of the flat metal particles is plane-oriented in a range of 0&#xb0; to 30&#xb0; with respect to a surface of the high refractive index layer, a volume fraction of the flat metal particles of the high refractive index layer is 20 volume % or more, and the flat metal particles are stacked in two or more layers, and an optical interference film using the high refractive index film.

High refractive index film and optical interference film

An organoelectroluminescent element which can satisfy both a high external quantum efficiency and high power efficiency at the same time, which has on a substrate an anode, a first intermediate organic layer composed of at least one organic layer, a light-emitting layer, a second intermediate organic layer composed of at least one organic layer, and a cathode in this order, and in which light is extracted from the aforementioned anode side, wherein the aforementioned light-emitting layer contains a light-emitting material that is oriented in the horizontal direction with the substrate, the order parameter of the aforementioned light-emitting material in the aforementioned light-emitting layer is at least 0.7, and the relationship between the thickness T1 (nm) of the aforementioned first intermediate organic layer and the thickness T2 (nm) of the aforementioned second intermediate organic layer is such that 1.1&#x3c;T1/T2&#x3c;4.0 and also such that 20 nm&#x3c;T2&#x3c;80 nm.

Organoelectroluminescent element, and light emission device, display device, and illumination device in which said organoelectroluminescent element is used

Provided is an infrared absorptive material having a high refractive index layer that has a refractive index of 3.0 or higher for infrared light at any wavelength in the wavelength range of 2 &#x3bc;m to 50 &#x3bc;m and has a thickness of 8 nm to 15,000 nm; and a reflective layer positioned on one face of the high refractive index layer.

Infrared absorptive material, infrared sensor, wavelength selective light source, and radiation cooling system

An antireflection film is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer in this order from the substrate, an anchor region including an oxide of an anchor metal is provided between the silver-containing metal layer and the interlayer, a cap region including an oxide of the anchor metal included in the anchor region is provided between the silver-containing metal layer and the dielectric layer, a crystal grain size obtained by X-ray diffraction measurement in the silver-containing metal layer is less than 6.8 nm, and the anchor metal has a surface energy less than a surface energy of silver and greater than a surface energy of a layer of the interlayer closest to the silver-containing metal layer.

Antireflection film, optical element, optical system, method of producing antireflection film

Provided are a far infrared reflective film including a base material and a far infrared reflective layer including a binder and flat conductive particles, in which a value obtained by dividing an average particle diameter of the flat conductive particles by an average thickness of the flat conductive particles is 20 or more, a thickness y nm of the far infrared reflective layer is 3 times or more the average thickness of the flat conductive particles, a volume fraction x of the flat conductive particles in the far infrared reflective layer is 0.4 or more, and a product x&#xd7;y of the volume fraction x and the thickness y satisfies Expression A, a heat shield film including the far infrared reflective film, and a heat shield glass including the far infrared reflective film. 

Far infrared reflective film, heat shield film, and heat shield glass

Provided is a wavelength-selective absorptive material which includes, in the following order: a base material; a reflective layer; and a high refractive index layer having a refractive index n of 3.0 or more with respect to infrared light having a wavelength range of 8 &#x3bc;m to 13 &#x3bc;m, having a thickness d of 30 nm to 1,000 nm, and containing a binder and flat metal particles; and an infrared absorptive layer having a maximum absorption wavelength in a wavelength range of 8 &#x3bc;m to 13 &#x3bc;m, in which a product n&#xd7;d of the refractive index n and the thickness d is more than 1,000 and less than 4,875.

Wavelength-selective absorptive material, infrared sensor, wavelength-selective light source, and radiation cooling system

Provided are a heat ray-shielding material having a frame body including a plurality of frames having a cell structure and a plurality of films attached to some or all of the plurality of frames in the frame body, in which at least some of the plurality of films shield near-infrared light, and cell sizes in the plurality of frames are larger than visible light optical wavelengths, whereby the heat ray-shielding material is lightweight, capable of selectively shielding heat rays, that is, near-infrared rays, can be applied to a variety of uses, and can be independently used as movable members, easily removable members, and members having a collapsible structure, an architectural member, a cage member, and a side surface wall.

Heat ray-shielding material and architectural member, cage member, and side surface wall using the same

A radiative cooling device including: a heat insulating container having an opening portion, and being configured to house an object to be cooled at an interior thereof and thermally insulates the object from an exterior thereof; a far-infrared radiator that is arranged between the object and the opening portion in the heat insulating container, that thermally contacts the object, and that radiates far-infrared rays in a wavelength range of from 8 &#x3bc;m to 13 &#x3bc;m; a far-infrared transmitting window member that closes at least part of the opening portion of the heat insulating container and that transmits the far-infrared rays radiated from the far-infrared radiator; and an intermediate heat insulating member that is arranged between the far-infrared transmitting window member and the far-infrared radiator, that thermally insulates the far-infrared transmitting window member and the far-infrared radiator from each other, and that transmits the far-infrared rays radiated from the far-infrared radiator.

Radiative cooling device

An anti-reflection optical member has a laminated structure including: a transparent substrate having a first refractive index greater than that of a predetermined medium; a metal-microparticle-containing layer containing metal microparticles; and a dielectric layer having a second refractive index greater than that of the predetermined medium, in this order. At least 60% of the metal microparticles are flat particles with a diameter-to-thickness ratio of 3 or more. Principal planes of the flat metal particles are surface-oriented in the range from 0&#xb0; to 30&#xb0; relative to the surface of the metal-microparticle-containing layer. In the metal-microparticle-containing layer, the metal microparticles are disposed without forming a conductive path. The dielectric layer has such a thickness that light reflected at the surface of the dielectric layer of incident light entering the laminated structure from the surface is interfered and canceled by light reflected at the interface between the dielectric layer and the metal-microparticle-containing layer.

Anti-reflection optical member

In an electromagnetic cloaking structure, a refractive index distribution has a high refractive index region which is provided around a shielding space and has a maximum value in a plane surrounding the shielding space and in which a refractive index decreases gradually from the centroid of the shielding space along a radial line passing through the plane so as to be close to an average refractive index and a low refractive index region which has a minimum value at two points having the shielding space and the high refractive index region interposed therebetween on a virtual optical axis passing through the shielding space and in which the refractive index increases gradually from the two points in a direction opposite to the high refractive index region on the virtual optical axes, on which the two points are placed, so as to be close to the average refractive index.

Growing community of inventors

Kanagawa, Japan

Hideki Yasuda