Mitsubishi Chemical Corporation

Mitsubishi Chemical Industries Limited

Mitsubishi Kasei Corporation

Hideki Nagasaka

Akihisa Murata

Toshiyuki Urano

Noriaki Takahashi

Ryuichiro Takasaki

Konoe Miura

Tameichi Ochiai

Katsuko Ohta

Masaaki Tsuchiyama

Tetsuo Murayama

Hiroshi Ide

Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate

Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate

Positive photosensitive composition, positive photosensitive lithographic plate and method for making positive photosensitive lithographic printing plate

A positive photosensitive composition comprising at least (a) an alkali-soluble resin and (b) a photo-thermal conversion material, which further contains (c) a compound capable of crosslinking the alkali-soluble resin by a thermal action, and which contains substantially no compound which has a function to generate an acid when exposed in the coexistence of the photo-thermal conversion material.

Positive photosensitive composition, positive photosensitive

Photosensitive composition and lithographic printing plate

A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:

Photopolymerizable composition and photosensitive lithographic printing

Photopolymerizable composition

A photopolymerizable composition comprising at least an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, which system comprises (a) a sensitizer of the formula (I): ##STR1## wherein each of R.sup.1 to R.sup.6 is hydrogen, halogen, alkyl, aryl, aralkyl, acyl, alkoxycarbonyl, optionally substituted hydrocarbon ring, optionally substituted heterocyclic residue or --SO.sub.3 --R.sup.8, wherein R.sup.8 is hydrogen, alkyl, aryl, aralkyl, alkali metal, or quaternary ammonium, R.sup.7 is hydrogen, alkyl, aryl, aralkyl, optionally substituted hydrocarbon ring, or optionally substituted heterocyclic group, each of X.sup.1 and X.sup.2 is halogen, alkyl, aryl, aralkyl, optionally substituted hydrocarbon ring, or optionally substituted heterocyclic group, and (b) a titanocene compound.

Polymerizable composition containing pyrromethene type coloring matter

A photopolymerizable composition comprising an addition polymerizable ethylenically unsaturated compound and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:

A photopolymerizable composition which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, characterized in that said photopolymerization initiator system essentially consists of:

Photopolymerizable compositions

Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.

Positive photosensitive compositions with 1,2-naphthoquinone diazide and

Positive photosensitive composition of cocondensed .beta.-naphthol and

A photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator, characterized in that the initiator comprises (a) a compound of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are alkyl group, n is 1, 2 or 3 and ring A is an aromatic ring containing nitrogen atom, and (b) hexaarylbiimidazole. The initiator may additionally contain a thiol of the formula: ##STR2## wherein Z is --O--,--S-- or --NH--. The composition is not only highly sensitive to ultraviolet ray but also highly stable in storage.

Photopolymerizable composition comprising tertiary aromatic amine and

An electrophotographic plate comprising an electroconductive substrate and a photosensitive layer coated thereon, wherein said photosensitive layer comprises an azo compound represented by the general formula (I) ##STR1## wherein A is a divalent group of an aromatic hydrocarbon or a divalent group of a heterocyclic ring containing at least one nitrogen atom in the ring, Ar is an aromatic hydrocarbon group or a heterocyclic group which may be bonded through a connecting group, and n is an integer of 1, 2 or 3.

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Yokohama, Japan

Hideki Nagasaka