Sony Corporation

Shibaura Mechatronics Corporation

Sony Interactive Entertainment Inc.

Casio Computer Co., Ltd.

Nec Corporation

Sony Group Corporation

Sony Semiconductor Solutions Corporation

Hitachi Global Storage Technologies Netherlands B.v.

Japan Tobacco Inc.

Hideki Mori

Yoshinori Hayashi

Masaaki Furuya

Tetsujiro Kondo

Hiroaki Kobayashi

Takuo Morimura

Hiroshi Wakaba

Koichi Miyazono

Yoko Ono

Shigeru Kanematsu

Minoru Usui

Ken Yoshino

Yasuhiko Suga

Kenichi Ookubo

Kouji Yamagishi

Masashi Uchida

Daisuke Kikuchi

Takeshi Miyai

Takaaki Miyamoto

Kentaro Fukazawa

Takeshi Kunihiro

Toru Tanikawa

Hirokazu Ejiri

Shizuo Chikaoka

Hirosuke Nagano

Seiichi Inomata

Yuya Aoki

Kenji Azami

Terukazu Ohno

Nobuyuki Yoshitake

Shinobu Yamada

Takeki Kogawa

Masao Kawamura

Shunsuke Harasaki

Hiroshi Matsuda

Tetsuya Nakamura

Yasushi Okumura

Koichi Hamada

Yoshiaki Nakamura

Minoru Kohno

Koichi Shiono

Takayuki Gomi

Takaaki Deguchi

Chihiro Arai

Yoshihisa Takahashi

Nobuo Kobayashi

Kenichiro Hosokawa

Satoshi Matsumura

Masaomi Nishidate

Hideo Kasama

Kazuyuki Arimatsu

Yoshiaki Kurokawa

Shunsuke Tawada

Kouya Nakamura

Tomohiro Mogi

Hiroya Matsugami

Yasushi Watanabe

Shozo Kawasaki

Noriaki Mitsui

Nobuhiko Higashi

Akimasa Hori

Kentaro Kasai

Hirofumi Kaneko

According to one embodiment, a processing liquid supply device includes: a tank that stores the processing liquid; a supply path that supplies the processing liquid to the processing device; a heater that heats the processing liquid; a thermometer that measures a temperature of the processing liquid; a densitometer that measures a concentration of the processing liquid; and a controller including an inspecting unit that inspects the densitometer. The inspecting unit includes: a temperature setting device that sets a boiling point temperature at which a predetermined concentration is reached as a predetermined temperature; a heating controller that heats the processing liquid by the heater so as to reach a target temperature within a predetermined range; and a determination device that determines whether or not the concentration of the processing liquid is a target concentration within a predetermined range based on the predetermined concentration.

Processing liquid supply device, substrate processing apparatus, and method for inspecting processing liquid supply device

Provided is a display control system that can express various display modes. The display control system has a display control section that causes a display object to be displayed, which includes a plurality of elements respectively associated in advance with a plurality of lattice points included in a lattice-shaped operating device, and acquiring means that acquires position coordinates of each of the plurality of lattice points, and the display control section determines a display mode of each of the plurality of elements on the basis of the position coordinates of the plurality of lattice points associated in advance with the plurality of elements, respectively.

Display control system, display control method, and program

According to one embodiment, provided is a supply tank a supply device, and a supply system that stabilizes the liquid temperature of a process liquid to be supplied to a substrate processing device. A supply tank that supplies a process liquid to a substrate processing device includes a container that stores the process liquid, a first dividing plate that divides the container into a first region where the process liquid is introduced, and a second region that supplies the process liquid to the substrate processing device, first piping that feeds, to the second region, the process liquid introduced in the first region, and a first heater which is provided on a path through the first piping, and which heats the process liquid.

Supply tank, supply device and supply system

A supply device includes a collect tank which collects a process liquid from a substrate processing device and heats the collected liquid, and a supply tank connected to the collect tank and which supplies, to the substrate processing device, the process liquid heated in the collect tank. The collect tank includes a collect container that stores the process liquid, a first dividing plate that divides the collect container into a first region where the process liquid is introduced from the substrate processing device, and a second region that introduces the process liquid to the supply tank, piping that feeds, to the second region, the process liquid introduced in the first region, a first heater provided on a path through the piping and which heats the process liquid, and feed piping that feeds, to the supply tank, the process liquid in the second region and heated by the first heater.

Supply device and supply system

According to one embodiment, a processing liquid supply device includes a plurality of tanks, a supply path that supplies a processing liquid to a processing device, a heating unit that heats the processing liquid, a dilution unit that dilutes the processing liquid, a new-liquid supply unit that supplies a new liquid, a common flow path through which the processing liquid of the plurality of tanks passes, a switching unit that switches between the plurality of tanks so that at least a tank is selected from which the processing liquid passes to the common flow path, a densitometer provided in the common flow path, and a control device that controls at least one of the heating unit, the dilution unit, and the new-liquid supply unit so that the concentration reaches a target value set in advance.

Processing liquid supply device, substrate processing apparatus, and processing liquid supply method

An App image includes a display target area displayed on a cylindrical screen, a left margin area, and a right margin area. When a particle comes into contact with a boundary of the display target area and the right margin area, a display apparatus arranges, in the left margin area, a particle in the same mode as the mode of the particle such that the particle comes into contact with a boundary of the display target area and the left margin area. The display apparatus generates a plurality of images such that as the particle moves out to the right margin area from the display target area, the particle enters the display target area from the left margin area.

Display apparatus, display method, and computer program

By stably separating a melting location of a fuse () from conductive layers (A,B), reliable melting of the fuse () is enabled. A fuse () including a fuse body (A) and two pads (Ba,Bb) connected by this and two conductive layers (A,B) individually connected to the two pads (Ba,Bb) are formed in a multilayer structure on a semiconductor substrate (). A length of the fuse body (A) is defined so that the melting location of the fuse () becomes positioned in the fuse body (A) away from the region overlapped on the conductive layer (A orB) when an electrical stress is applied between two conductive layers (A,B) and the fuse () is melted.

Semiconductor device

Provided is an information processing device coupled to a device which a user operates with a hand of the user and on the surface of which a plurality of sensors that each output information associated with a spatial positional relation with the surface of the hand of the user are arranged, the information processing device being configured to receive output from each of the sensors included in the device and generate an image in which an image element having been drawn with a pixel value determined on the basis of a value represented by the output from each of the sensors is arranged at a position corresponding to a position at which each of the sensors is arranged, on a mapping space obtained by plane-unfolding a portion that constitutes the surface of the device and on which the sensors are arranged, Further, the information processing device is configured to, upon receipt of input of the generated image, estimate information associated with the position of each of joints of the hand of the user who operates the device and output the estimated information as coordinate information in a three-dimensional space whose origin is placed on a point that moves with the device.

Information processing device, information processing method, and program

Provided is a control apparatus that receives information regarding a motion of user's fingers and information regarding a shape of user's hands, generates first pose information indicative of a pose of user's hands in accordance with the received information regarding the motion of user's fingers, generates second pose information indicative of a pose of user's hands in accordance with the received information regarding the shape of user's hands, combines the generated first pose information with the generated second pose information in accordance with criteria based on a predetermined condition, and generates and outputs information indicative of the pose of user's hands.

Control apparatus, information processing system, control method, and program

The electrostatic protective device includes an insulator and a semiconductor layer. The semiconductor layer includes a device forming region and a device separating region. The device forming region includes a primary first conductive impurity diffused layer, a body region, a secondary first conductive impurity diffused layer, and a second conductive region that are arranged in order. The second conductive region includes a second conductive impurity diffused layer separated electrically from the body region. The device separating region includes a device separating layer that surrounds the device forming region. A gate electrode is further provided on the body region in the semiconductor layer with an insulating film interposed in between.

Electrostatic protective device and electrostatic protective circuit

A substrate treatment apparatus which can more efficiently regenerate phosphoric acid which is able to be returned to etching treatment along with such etching treatment as much as possible without using a large facility, that is, a substrate treatment apparatus which treats a silicon substrate W on which a nitride film is formed by a liquid etchant which contains phosphoric acid, which comprises an etching treatment unit (the spin treatment unit) which gives a suitable quantity of liquid etchant to each substrate which is fed one at a time so as to etch the substrate and remove the nitride film, a phosphoric acid regenerating unit (the spin treatment unit) which mixes liquid etchant used for treatment of one substrate and a suitable quantity of liquid hydrofluoric acid for the amount of the used liquid etchant under a predetermined temperature environment to regenerate the phosphoric acid, and a phosphoric acid recovery unit (the pump, phosphoric acid recovery tank, and pump) which returns the phosphoric acid which was obtained by the phosphoric acid regenerating unit to the liquid etchant to be used at the etching treatment unit.

Substrate treatment method and substrate treatment apparatus

A swing-open type package has a box body (), a lid () to be put onto the box body () from above, and a swing device connecting the lid () and the box body (), the swing device including a movable rear wall portion () formed by a part of a rear wall of the box body (), and a support flap () connecting the lid () and a transverse wall () of the box body (), and enables a swing motion of the lid () when a front wall of the lid () is raised from the boxy body () so that the swing motion causes the lid () to tilt and open wide.

Swing-open type package

A semiconductor device includes a first conductivity type base formed on a surface of a substrate, a second conductivity type emitter formed on a surface of the base, a second conductivity type doped region which, along with accepting a first type of carrier from the emitter, injects the first type of carrier into the base, and is arranged to be spaced apart on the surface of the base from the emitter, and a second conductivity type collector which is formed on an opposite side to the emitter and the doped region, interposing the base.

A semiconductor device includes a first conduction-type semiconductor substrate, a first semiconductor region of a first conduction-type formed on the semiconductor substrate, a second semiconductor region of a second conduction-type formed on a surface of the first semiconductor region, a third semiconductor region of the second conduction-type formed to be separated from the second semiconductor region on the surface of the first semiconductor region, a fourth semiconductor region of the second conduction-type formed to be separated from the second semiconductor region and the third semiconductor region on the surface of the first semiconductor region, and a first electrode connected to the second semiconductor region and the third semiconductor region.

A feature analysis apparatus which enables visual confirmation of features of an inspected object and which enables limitations on the degree of freedom of classification based on the features to made relatively smaller is provided. It acquires inspected object information of an inspected object (S), analyzes the inspection information to determine values of feature parameters of each of the plurality of layers (Sto S), uses values of the plurality of feature parameters and their corresponding directions for each of the plurality of layers to generate a single parameter vector (Sto S), converts the parameter vector to a layer vector which is a 3D vector in a predetermined (Sto S), and couples the plurality of layer vectors obtained for the plurality of layers in the order of the layers and generates a set of coordinate values of the plurality of nodes obtained in the 3D space as feature information of the inspected object (S).

Feature analyzing apparatus for a surface of an object

Growing community of inventors

Kanagawa, Japan

Hideki Mori