Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hideki Itai

Hajime Kawano

Satoru Yamaguchi

Kei Sakai

Shahedul Hoque

Yoshinori Momonoi

Kumiko Shimizu

Yasunori Takasugi

Minoru Yamazaki

Yoshihiro Kimura

Wataru Mori

Kazunari Asao

Zhigang Wang

Hiroshi Nishihama

Toshimasa Kameda

The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector. In the charged particle beam device, the computation processing device specifies, from within the generated image, a relatively dark region with respect to other parts thereof, and controls the deflector in such a manner that the charged particle beam selectively scans a sample position corresponding to the dark region.

Charged particle beam device for imaging vias inside trenches

A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m&#x2265;1), the number m of frames being smaller than the number n of frames.

Charged particle beam device having inspection scan direction based on scan with smaller dose

Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image () which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image () which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.

Charged particle beam apparatus

The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

Charged particle beam device

In order to solve the problem that the resolution of a back-scattered electron image without a contrast difference between materials with close atomic numbers is low, an image processing apparatus that performs an image process on a back-scattered electron image as an input image includes: a material peak detection unit that determines a peak luminance value with a peak of a frequency of a luminance histogram based on a luminance value obtained for each measurement position by using the input image as an input and information about material-dependent back-scattered electron generation efficiency, and that outputs the peak luminance value for each material; and an image information adjustment unit that emphasizes a material-dependent contrast on the basis of the input image and the peak luminance value for each material.

Image processing apparatus, image processing method

Growing community of inventors

Tokyo, Japan

Hideki Itai