Nippon Paper Industries Co., Ltd.

Sumco Corporation

Jujo Paper Co., Ltd.

Yokogawa Electric Corporation

Mitsubishi Materials Corporation

Koa Corporation

San Nipco Limited

Hideki Fujiwara

Hiroshi Kishi

Kouta Hasebe

Takahiro Abe

Hiroshi Ono

Takashi Ochi

Isao Kano

Takehide Kasahara

Katsuhiko Matsunaga

Toshiyuki Takano

Eriko Kitahara

Hirokazu Morii

Kunio Hata

Fuminari Nonomura

Toshimi Satake

Toshiaki Minami

Mitsutoshi Nakamura

Hiroaki Taguchi

Toshinori Ishii

Hideki Hayasaka

Koji Okomori

Jun Makihara

Kazuhiro Ikezawa

Mizuho Shimoyama

Osamu Kozuka

Hidehiko Kai

Hideaki Nisogi

Chizuru Wakai

Akihiro Ooshima

Ryusuke Suzuki

Tsutomu Miyata

Yoshinobu Nakano

Masaya Tosaka

Tomotaka Morikawa

Tomoya Taguchi

Yukiko Oohira

Jyunichi Komai

Chizuru Kaga

Kohei Tomonaga

Toshiyuki Nakao

Tatsuya Kawahara

Naofumi Iwamoto

Yasushi Hyono

Takashi Komekyu

A quartz glass crucible has, from an inner surface side toward an outer surface side of the crucible, an inner transparent layer, a bubble layer, an outer transparent layer, and a crystallization accelerator-containing layer. An outer transition layer where a bubble content decreases from the bubble layer toward the outer transparent layer is provided at a boundary between the bubble layer and the outer transparent layer, and a thickness of the outer transition layer is 0.1 mm or more and 8 mm or less.

Quartz glass crucible, manufacturing method therefor, and method for manufacturing silicon single crystal

A quartz glass crucibleincludes: a quartz glass crucible bodyhaving a cylindrical side wall portion, a curved bottom portion, and a corner portionwhich has a larger curvature than that of the bottom portionand connects the side wall portionand the bottom portionto each other; and an inner-surface coating filmA which contains a crystallization accelerator and is formed on an inner surfaceof the quartz glass crucible body, in which the inner surfaceof the quartz glass crucible bodyis under compressive stress. The quartz glass crucible has high durability even at a high temperature during a single crystal pull-up step and is capable of reducing a generation ratio of pinholes in a silicon single crystal.

Quartz glass crucible

A quartz glass crucible () includes: a crucible body () made of silica glass; and a crystallization-accelerator-containing layer () formed on an outer surface of the crucible body (). A concentration of a crystallization accelerator contained in the crystallization-accelerator-containing layer () is 1.0×10atoms/cmor more and 4.8×10atoms/cmor less. The quarts glass crucible is intended to be capable of not only enduring a single crystal pulling-up process that takes a very long time, such as multi-pulling, but also stably controlling the oxygen concentration and crystal diameter of a silicon single crystal by eliminating a gap between the carbon susceptor and the crucible as much as possible.

Quartz glass crucible with crystallization-accelerator-containing layer having gradient concentration

In an exemplary embodiment, a quartz glass crucibleincludes: a cylindrical crucible bodywhich has a bottom and is made of quartz glass; and crystallization-accelerator-containing coating filmsA andB which are formed on surfaces of the crucible bodyso as to cause crystallization-accelerator-enriched layers to be formed in the vicinity of the surfaces of the crucible bodyby heating during a step of pulling up a silicon single crystal by a Czochralski method. The quartz glass crucible is capable of withstanding a single crystal pull-up step undertaken for a very long period of time, such as multi-pulling, and a manufacturing method thereof.

Quartz glass crucible and manufacturing method thereof

A hermetic terminal () includes a barrier wall () to be joined to a housing (), a body () that is to be connected to a signal ground and is fixed to the barrier wall () via a first insulator (), and a signal line () passing through the body () and fixed to the body () via a second insulator (). When the barrier wall () is joined to the housing (), a space () is formed between an inner wall of the housing () and a surface () of the body () intersecting an end face () of the body () positioned towards the inside of the housing ().

Hermetic terminal and sensor unit

In an exemplary embodiment, a quartz glass crucibleincludes: a cylindrical crucible bodywhich has a bottom and is made of quartz glass; and a first crystallization-accelerator-containing coating filmA which is formed on an inner surfaceso as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surfaceof the crucible bodyby heating during a step of pulling up the silicon single crystal by a Czochralski method. The quartz glass crucible is capable of withstanding a single crystal pull-up step undertaken for a very long period of time.

Quartz glass crucible, manufacturing method thereof, and manufacturing method of silicon single crystal using quartz glass crucible

Internal electrodes, a protective film, and protective films covering the top parts of internal electrode sides of lead wires are formed on a top surface of a substrate of a temperature sensor element, thereby making the overall shape a quadrangular prism and the transverse cross-section nearly a square even at any portion in the axial direction. A heating part of the temperature sensor element is provided near the center along the length, the height, and the width of the element, thereby preventing deviation of heat generation and stabilizing heat release to the lead wires. This allows the temperature sensor element to suppress fluctuation in detected temperatures due to mounting angle.

Platinum temperature sensor element

A sensor unit may include a ceramic member including a first face and a second face opposite to each other with a predetermined interval, a sensor part mounted on the first face, a plurality of metal pins fixed to the second face, a plurality of internal wirings passing through the ceramic member, each of the plurality of internal wirings connecting the sensor part with one of the plurality of metal pins, and a metal member formed on a circumferential end of the second face and joined with a housing by welding.

Sensor unit

This silicon electrode plate for plasma etching is a silicon electrode plate for plasma etching with superior durability including silicon single crystal which, in terms of atomic ratio, contains 3 to 11 ppba of boron, and further contains a total of 0.5 to 6 ppba of either or both of phosphorus and arsenic.

Silicon electrode plate for plasma etching with superior durability

A method of manufacturing a gravure printing paper includes: providing a substance having an effect of inhibiting a binding between pulp fibers; preparing a mixture of pulp fibers and fillers; and adding the substance to the mixture; making a gravure printing paper using the substance-added mixture.

Method of manufacturing gravure paper

Produce a slipping property imparting agent for clear coat that reduces scum production: wherein, (1) the agent comprises a copolymer whose constituents are unsaturated olefin (constituent (a)) and unsaturated carboxylic acid (carboxylate) (constituent (b)); (2) constituent (a) accounts for 50 to 99 mol percent and constituent (b) accounts for 50 to 1 mol percent, respectively, of the total mol number of constituents (a) and (b) combined; and (3) a constituent (c) that can be polymerized with the constituents (a) and (b) is contained, as necessary, by up to 20 mol percent of the total mol number of constituents (a) and (b) combined.

Slipping property imparting agent for clear coating and clear coating paper having the agent applied thereon

A coated printing paper the product of whose basis weight, density, Young's modulus in the machine direction and breaking length in the machine direction is within the range of no less than 1.0&#xd7;10g&#xb7;N/mbut not greater than 4.0&#xd7;10g&#xb7;N/m, and which offers excellent pliability, superior print gloss in the image area regardless of lower white-paper gloss, minimal small-scale gloss variations in the image area, and excellent workability with the printing machinery, more particularly a matte coated paper, is provided.

Printing coated paper

A surface-treatment agent containing at least one type of processed starch selected from a) to c) as listed below is applied to a base paper of a newspaper so that a product of a B-type viscosity of the surface-treatment agent, measured under conditions of 10% concentration at 50&#xb0; C. (rotor No. 1 at 60 rpm), and an application amount of the surface-treatment agent (both sides) is within a range of 2 to 15 cps&#xb7;g/m;

Newspaper for offset printing

A coated paper for gravure printing that offers good gravure printability resulting from reduced missing dots while at the same time achieving high sheet gloss, wherein the paper comprises a base paper and a coating layer containing a pigment and an adhesive. This paper also contains a compound having an effect of inhibiting the binding between pulp fibers, wherein the compound, when added to 0.3 weight-part per 100 parts of bone-dry pulp, will reduce the tensile strength of the paper by five % to 40% (as measured in accordance with JIS P 8133).

Coated paper for gravure

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Tokyo, Japan

Hideki Fujiwara