Hitachi High-Tech Science Corporation

Wakamoto Pharmaceutical Co., Ltd.

Ricoh Company, Ltd.

Mitsubishi Jidosha Kogyo Kabushiki Kaisha

Sii Nanotechnology Inc.

Seiko Instruments Inc

Universal Entertainment Corporation

Aruze Gaming America, Inc.

Hitachi High-Tech Corporation

Mitsubishi Jidosha Engineering Kabushiki Kaisha

Hidekazu Suzuki

Tatsuya Asahata

Atsushi Uemoto

Satoshi Yamazaki

Atsushi Itoh

Mitsuhiko Harara

Tetsuya Sakayori

Yo Yamamoto

Aiko Ohtsuka

Touru Oguma

Masanobu Takeuchi

Takanobu Tanaka

Yoshikazu Naito

Makoto Sato

Kenta Kitamura

Masumi Fujisawa

Tadao Tanaka

Takahiro Wada

Kenji Endo

Makoto Maeda

Shota Torikawa

Hiroki Nakamura

Kazuo Okada

Yoshihisa Kojima

Hiroyuki Suzuki

Toshiaki Fujii

Makoto Shohara

Hiromoto Yamauchi

Kenji Enokido

Yutaka Ikku

Takao Morita

Susumu Mio

Masayoshi Goto

Hideki Kikuchi

Masato Takada

Ikuko Nakatani

Tsutomu Matsukawa

Mamoru Okabe

Kenji Naito

Yoshihiro Tsuriya

Hideaki Okamoto

Daisuke Morizono

Yoshiaki Saito

Mike Hassel-Shearer

Kuniko Koichi

Koui Sagawa

Kouhei Yoda

Tadao Furutsu

Masanobu Kirita

Yoshihiro Toyoda

Kouichirou Saitou

Hiroko Yageta

Kensaku Miyake

Kaei Nagoshi

Ryoji Namekawa

Noriko Tahira

Reiko Hirata

Yasutomo Takeuchi

Disclosed are a charged particle beam apparatus and a sample processing observation method, the method including: a sample piece formation process in which a sample is irradiated with a focused ion beam such that a sample piece is cut out from the sample; a cross-section processing process in which the sample piece support holds the sample piece and a cross section thereof is irradiated with the ion beam to process the cross section; a sample piece approach movement process in which the sample piece support holds the sample piece and the sample piece is moved to a position that is closer to an electron beam column than an intersection point of beam optical axes of the ion beam and an electron beam is; and a SEM image acquisition process in which the cross section is irradiated with the electron beam to acquire the SEM image of the cross section.

Charged particle beam apparatus and sample processing observation method

An object of the invention is to provide a technique of capturing images at higher speed and higher magnification when acquiring continuous tilted images with an electron microscope. The electron microscope of the invention includes a first spherical receiver fixed to a column of the electron microscope and configured to slide with a spherical fulcrum provided at a tip end of a sample holder; a spherical surface part provided on the column; and a second spherical receiver provided outside the column. The spherical surface part and the second spherical receiver slide on a contact part between the spherical surface part and the second spherical receiver, and a track of the slide is along a spherical surface centered on a central axis of the first spherical receiver, so that a view shift and a focus shift from an observation position of a sample can be reduced.

Electron microscope

An image processing system is provided that includes an image capturing apparatus configured to generate a plurality of captured images and at least one information processing apparatus connected to the image capturing apparatus. The information processing apparatus includes processing circuitry configured to input at least a first captured image and a second captured image from among the plurality of captured images, acquire first conversion data to be used for converting the first captured image and second conversion data to be used for converting the second captured image, and generate an output image by stitching converted images generated by converting the first captured image based on the first conversion data and the second captured image based on the second conversion data.

Image processing system, image processing method, and computer-readable medium

Disclosed are a charged particle beam apparatus wherein the charged particle beam apparatus can efficiently performs finish processing of a sample and acquisition of a high-precision SEM image of a processing surface of the sample in a short time, and a sample processing observation method using the same. The charged particle beam apparatus includes: a gallium ion beam column radiating a gallium ion beam toward a sample to form a cross-section of the sample; an electron beam column having a semi-in-lens type objective lens and radiating an electron beam toward the sample; a gas ion beam column radiating a gas ion beam toward the sample to perform finish processing of the cross-section of the sample, wherein the gas ion beam has a beam diameter larger than a maximum diameter of the cross-section of the sample.

A charged particle beam apparatus includes: an irradiation unit that irradiates a sample with a charged particle beam; an image formation section that detects a charged particle generated from the sample due to the irradiation with the charged particle beam and forms an image based on a signal obtained by detecting the charged particle; an input reception unit that receives an observation condition; a derivation section that derives second observation parameters proper for the observation condition based on the received observation condition and first observation parameters stored in a storage unit; and a control unit that controls the irradiation unit based on the second observation parameters.

Charged particle beam apparatus and method for controlling charged beam apparatus

A display control method includes: inputting user's image including a drawing portion made by hand drawing and being a display target image; and performing image control including causing the input user's image to emerge from any one of a left end and a right end of a predetermined display region, on which the user's image is to be displayed, and moving the user's image that has emerged.

Display control method, display control device, and display system

Provided is a gaming machine which does not bore the player through reel actions until completion of rearrangement of symbols. Under the condition where predetermined symbols are aligned on a payline when the symbols of a first scroll line of at least one of a plurality of scroll lines are being scrolled and symbols on the remaining second scroll lines are stopped, the gaming machine changes scrolling motion of symbols of the first scroll line.

Gaming machine arranging symbols

A cross section processing method and a cross section processing apparatus are provided in which it is possible to form a flat cross section in a sample composed of a plurality of substances having different hardness by a focused ion beam. The etching of a processing area is performed while variably controlling the irradiation interval, the irradiation time, or the like of a focused ion beam based on cross section information of an SEM image obtained by the observation of a cross section. In this way, even if a sample is composed of a plurality of substances having different hardness, it is possible to form a flat observation surface with a uniform etching rate.

Cross section processing method and cross section processing apparatus

Display control method configured to cause an input image to emerge and move on a display region, display control device, and display system configured to perform same

A TEM sample preparation method including: placing a thin sample on a sample holder so that a first side surface of the thin sample which is closer to a desired observation target is opposed to a focused ion beam column; setting a processing region, which is to be subjected to etching processing by a focused ion beam so as to form a thin film portion including the observation target and having a thickness direction substantially parallel to a thickness direction of the thin sample, to a region of the first side surface that is adjacent to the thin film portion; and performing the etching processing to a portion of the thin sample extending from the first side surface thereof to a front surface thereof by irradiating the processing region with the focused ion beam from the focused ion beam column.

TEM sample preparation method

A charged particle beam apparatus includes: a charged particle beam column; a detector configured to detect secondary charged particles; an image processor; a display device; a needle arranged in an irradiation area of charged particle beam; a needle actuator; a user interface; and a controller configured to control the needle actuator to actuate the needle in accordance with a target position that is set by the user interface. The controller controls the needle actuator to move the needle to track a change of the target position that is set by the user interface.

Charged particle beam apparatus having needle probe that tracks target position changes

A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.

Focused ion beam apparatus

A charged particle beam apparatus includes: a charged particle beam column configured to irradiate an irradiation target with a charged particle beam; a detector configured to detect secondary charged particles emitted from the irradiation target by the irradiation of the charged particle beam; a needle arranged in an irradiation area of the charged particle beam; a needle actuator configured to actuate the needle; and a controller configured to control the needle actuator to actuate the needle along a movement route that is configured by a preset target position and preset way points. The controller controls the needle actuator to set an actuating direction of the needle for each of the way points.

Charged particle beam apparatus having improved needle movement control

A composite charged particle beam apparatus includes a FIB column for irradiating a thin sample with a FIB and a GIB column for irradiating the thin sample with a GIB. The thin sample is placed on a sample stage, and a tilt unit tilts the thin sample about a tilt axis of the sample stage, the tilt axis being orthogonal to the FIB irradiation axis and being located inside a plane formed by the FIB irradiation axis and the GIB irradiation axis. A tilt sample holder is mounted on the sample stage and fixes the thin sample such that a cross-sectional surface of the thin sample is tilted at a constant angle with respect to the GIB irradiation axis and the azimuth angle of the GIB column can be changed by rotation of the sample stage.

Composite charged particle beam apparatus and thin sample processing method

Growing community of inventors

Tokyo, Japan

Hidekazu Suzuki