Pixtronix, Incorporated

Panasonic Liquid Crystal Display Co., Ltd.

Japan Display Inc.

Hitachi Displays, Ltd.

Hidekazu Nitta

Masataka Okamoto

Daisuke Sonoda

Takuo Kaitoh

Jun Fujiyoshi

Toshio Miyazawa

Tetsuya Nagata

Toshiki Kaneko

Hidekazu Miyake

Makoto Ohkura

Katsumi Matsumoto

Yasukazu Kimura

A display device and a method for manufacturing the same, for discharging static electricity generated in the manufacturing process of a display device using a mechanical shutter and thus preventing the mechanical shutter from being deformed by the static electricity are provided. The display device includes a TFT substrate having thin film transistors thereon respectively provided with a plurality of mechanical shutters located in a matrix and also having terminals thereon for supplying a signal to the thin film transistors from outside; and a counter substrate joined with the TFT substrate. Along at least one of an edge of the TFT substrate and an edge of the counter substrate, an injection opening for injecting an insulating liquid into an area between the TFT substrate and the counter substrate and a ground electrode for covering at least a part of an inner surface of the injection opening are provided.

Display device and method for manufacturing the display device

Provided is a display device, including: a sealing member including an opening and surrounding a space defined by a pair of light transmissive substrates; an end seal for closing the opening of the sealing member to form an encapsulation space; oil filled in the encapsulation space; a spacer for maintaining an interval between the pair of light transmissive substrates; a shutter; a drive portion arranged in the oil, for mechanically driving the shutter; and a wall portion formed on at least one of opposed surfaces of the pair of light transmissive substrates. The wall portion includes a part arranged at a position interrupting a shortest path between the opening of the sealing member and a display region. The wall portion is made of a material forming the spacer, the shutter, and the drive portion.

Display device and method for manufacturing the same

In a movable shutter-system display device, a movable shutter includes an amorphous silicon film material which has a low residual stress and thus is stable. A display device includes a display panel comprising a first substrate and a second substrate. The display panel includes a plurality of pixels; each of the plurality of pixels includes a movable shutter including amorphous silicon and a driving circuit for driving the movable shutter; and the amorphous silicon included in the movable shutter is formed of at least two amorphous silicon films, and where any two amorphous silicon films adjacent to each other among the at least two amorphous silicon films are a first amorphous silicon film and a second amorphous silicon film stacked on the first amorphous silicon film, the first amorphous silicon film and the second amorphous silicon film have different characteristic values.

Display device and method of manufacturing the display device

Provided is a display device, including: a sealing member including an opening and surrounding a space defined by a pair of light transmissive substrates; an end seal for closing the opening of the sealing member to form an encapsulation space; oil filled in the encapsulation space; a spacer for maintaining an interval between the pair of light transmissive substrates; a shutter; a drive portion arranged in the oil, for mechanically driving the shutter; and a wall portion formed on at least one of opposed surfaces of the pair of light transmissive substrates. The wall portion includes apart arranged at a position interrupting a shortest path between the opening of the sealing member and a display region. The wall portion is made of a material forming the spacer, the shutter, and the drive portion.

A pixel is formed by sealing an insulating liquid and floating particles in an area defined by a first substrate, a second substrate and partitions. The width of the partition has to be reduced in order to improve the pixel brightness by enlarging a flat electrode. In this case, the height of the partition has to be reduced for retaining the mechanical strength. If the height of the partition is reduced, an area of the partition electrode becomes small, thus failing to retain the memory effect. The planar surface of the partition is then formed into a zigzag shape so as to increase the area of the partition electrode.

Electrophoretic display device

Gate electrodes are formed on a substrate. A gate insulation film is formed so as to cover the gate electrodes. A semiconductor layer is formed in regions on the gate insulation film in a region which overlap with at least the gate electrodes. Plasma treatment is applied to the semiconductor layer using a gas which contains a dopant thus increasing impurity concentration of a surface layer of the semiconductor layer. A conductive film is formed on the surface layer of the semiconductor layer to which the plasma treatment is applied. A source electrode and a drain electrode are formed by etching the conductive film.

Growing community of inventors

Chiba, Japan

Hidekazu Nitta