Asahi Glass Company, Limited

Pacific Rundum Company Ltd.

Hideji Numata

Takuro Ono

Tomohiro Morishita

Nobuo Kageyama

Koji Furukawa

Ryuhei Makimura

Hiroji Sakemi

High purity silicon carbide parts for a heat treating apparatuses for semiconductors; composed mainly of .alpha.-type silicon carbide and silicon; characterized in that a particle sizes of the .alpha.-type silicon carbide crystals composing the high purity silicon carbide parts are not larger than 44 .mu.m; a weight mean particle size of the .alpha.-type silicon carbide crystals is in a range from 2 to 25 .mu.m; high purity silicon is filled up among the particles of the .alpha.-type silicon carbide crystals; and a content of iron as an impurity element contained in the high purity silicon carbide parts is not larger than 5 ppm.

Heat treating apparatuses for semiconductors and high purity silicon

A fired ceramic having dense and low thermal expansion characteristics comprises 0.3 to 8 wt. % of at least one of rare earth oxides and has a thermal expansion coefficient of less than 0.3% and a porosity of less than 10%. The fired ceramic having dense and low thermal expansion characteristics comprises a main component of cordierite, lithium aluminosilicates or aluminum titanate. The rare earth oxide is preferably Y.sub.2 O.sub.3 and can be CeO.sub.2 or La.sub.2 O.sub.3.

Fired ceramic having dense and low thermal expansion characteristics

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Takasago, Japan

Hideji Numata