Canon Kabushiki Kaisha

Hidehiko Fujioka

Takayuki Hasegawa

Takao Kariya

Yuji Chiba

Yutaka Tanaka

Nobutoshi Mizusawa

Shunichi Uzawa

Yoshito Yoneyama

Ryuichi Ebinuma

Shinichi Hara

Noriyuki Nose

Eigo Kawakami

Isamu Shimoda

Hiroshi Maehara

Yasuaki Fukuda

Tetsuzo Mori

Takeshi Miyachi

Mitsutoshi Kuno

Koji Uda

A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.

Processing system and device manufacturing method using the same

A processing system includes a processing chamber, a circulating device for purifying an inside ambience gas of the processing chamber and for circulating the purified gas back into the processing chamber, a measuring device for measuring the purity of the ambience gas, and an adjusting device for adjusting the purification capacity of the purifying device in accordance with an output of the measuring device. In another form, a processing system includes a first processing chamber in which a first process is to be performed therein, a second processing chamber in which a second process is to be performed therein, and a device for introducing an ambience gas, having been used in said first processing chamber for the first process, into the second chamber for reuse thereof. The gas subsequently used in the second chamber is introduced back into the first chamber for reuse of the gas. At least a portion of the circulated gas is purified to improve its purity. A purity sensor detects the purity of gas discharged from the second chamber and, in accordance with the detection, the capacity of gas purification is adjusted.

Processing system for semiconductor device manufacture of otherwise

A processing system for processing semiconductor devices includes an adjusting device for adjusting atmospheric conditions such as the cleanness and temperature in a clean room, at least one processing device disposed in the clean room, and a control device for controlling operation of the adjusting device in accordance with an operating state of at least one of the processing devices. The invention makes it possible to highly control the air conditioning of a required location and at a required time.

Processing System and semiconductor device production method using the

A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.

Substrate conveying device and method of controlling the same

A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.

Mask manufacturing method and apparatus and device manufacturing method

A stage mechanism suitable used in an exposure apparatus is disclosed, wherein heat generation of a coil assembly of a stage driving motor is prevented from adversely affecting a semiconductor substrate or measurement by a laser interferometer. A wafer chuck and the laser interferometer are disposed at a side of a base plate, and a stage and an electromagnetic coil for dirving the stage are disposed at the other side of the base plate. The wafer chuck and the stage are coupled to each other by a coupling member which extends through a bore formed in the base plate.

Stage mechanism in exposure apparatus

The sonic velocity in a chamber which is filled with helium is measured by using ultrasonic waves, and the temperature in the chamber is also measured. Purity information relating to helium gas contained in the chamber is determined on the basis of the measured values of the sonic velocity and the temperature.

Method of measuring gas purity information, chamber unit and exposure

An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.

X-ray mask structure

A substrate holding apparatus for vertically holding a substrate to be exposed by radiation includes a substrate holding member for attracting a substrate by a magnetic force or vacuum and an engaging device for engaging the substrate on the substrate holding member. The engaging device is retractably supported by or fixed to the substrate holding member, and is engageable with or engages the substrate in such a manner that the engagement between the vertically held substrate and the engaging device is maintained even if the substrate holding member ceases to attract the substrate. Thus, dropping of the substrate by gravitation is prevented even if the substrate ceases to be attracted by the substrate holding member.

Substrate holding apparatus for vertically holding a substrate in an

Disclosed is a method of exposure control for use in a step-and-repeat type exposure apparatus that includes a radiation source for emitting a radiation beam and a workpiece holding chuck having an attracting surface. The method includes placing a first workpiece on the attracting surface of the holding chuck so that the workpiece is attracted to and held by the holding chuck, moving the holding chuck stepwise so that different portions of the workpiece are sequentially brought to an exposure station and exposing that portion of the first workpiece placed at the exposure position, detecting the temperature of the attracting surface of the holding chuck each time a portion of the first workpiece is exposed, memorizing data related to the detected temperature, removing the first workpiece from the holding chuck and placing a second workpiece on the attracting surface of the holding chuck, moving the holding chuck, bearing the second workpiece, stepwise for exposure of different portions of the second workpiece and adjusting the temperature of the attracting surface of the holding chuck each time a portion of the second workpiece is brought to the exposure position, in accordance with the memorized data.

Exposure control method for adjusting the temperature of a workpiece

A mask cassette and mask cassette loading device, suitably usable in an X-ray exposure apparatus for exposing a wafer to a mask with X-rays contained in synchrotron radiation, to print a pattern of the mask on the wafer, are disclosed. The mask cassette includes a base for accommodating a plurality masks and a cover which can be separated from and coupled to the base only in one direction. When the two are coupled by a locking mechanism, the cassette can be completely closed against atmospheric pressure. The mask cassette loading device includes a common mechanism which serves to release the locking mechanism of the cassette and also, to move the cassette base relative to the cover. Thus, with a simple and compact structure, the protection and replacement of X-ray masks are ensured with certainty.

Mask cassette and mask cassette loading device

A device for detachably holding a mask at least a portion of which is made of a magnetic material. The device includes a holding member, on which the mask is to be held, the holding member having a portion made of a magnetic material; a first system for producing holding magnetic lines of force so as to generate a magnetic force between the magnetic portion of the holding member and the magnetic portion of the mask, to thereby hold the mask on the holding member; and a second system for producing releasing magnetic lines of force which are operative against the magnetic lines of force produced by the first system so as to reduce the same to a degree sufficient to disengage the mask from the holding member. Also, disclosed is a mask holding device for detachably holding a mask, typically for use in the manufacture of microcircuits, which device is arranged to hold the mask by use of a magnetically attracting force, the magnetically attracting force being made variably controllable so as to correct the flatness of the mask.

Growing community of inventors

Yamato, Japan

Hidehiko Fujioka