Matsushita Electric Industrial Co., Ltd.

Shin-etsu Chemical Co., Ltd.

Japan Atomic Energy Research Institute

Matsushita Electric Ind. Co., Ltd.

Hideharu Tamura

Kazufumi Ogawa

Norihisa Mino

Toshinobu Ishihara

Yasuhisa Tanaka

Motoyoshi Hatada

Mikio Endou

An alignment film for liquid crystal formed by monomolecular film comprising silane-type compounds with a linear hydrocarbon chain and method for production of said film, as well as liquid crystal display units utilizing said film and method for production of said display unit are disclosed.

Alignment film with long and short carbon chains absorbed silane with

A method for making an optical recording medium having an optically responsive polydiacetylene monomolecular film or monomolecular built-up film is provided. In the method, a substrate having a hydrophilic surface is immersed in a solution, in organic solvent, of a substance containing a diacetylene group and an --Si--Cl group to form a monomolecular film of the substance on the substrate by chemical adsorption. The diacetylene groups are polymerized by energy beam irradiation to obtain the optically responsive polydiacetylene film. This medium is usable as a write-once or rewriteable medium.

Method for making optical recording mediums

A method of fabricating a semiconductor device by (1) forming a semiconductor device having electrodes on the semiconductor substrate, (2) immersing the substrate into a solution which contains a silane group surface active agent so that a monomolecular film is formed an a surface of the substrate, and (3) molding the substrate having the monomolecular film by a synthetic resin. The monomolecular film functions as a protection film for protecting the semiconductor device.

Method for fabricating semiconductor device

This invention is to present a magnetic recording medium protective film possessing a metal oxide film on the surface of a magnetic disc substrate, and having a silane monomolecular adsorption film formed on this metal oxide film by chemical adsorption. According to this invention, the monomolecular adsorption film can be formed on the surface of magnetic recording medium without pinhole and in uniform thickness, which may contribute to improvement of the slipping property of the magnetic head, that is, enhancement of the wear resistance, so that a magnetic recording medium of high density, high reliability, and high performance may be realized.

Forming method of magnetic recording medium protective film

Alignment film for liquid crystal and method for production thereof, as

A process for producing a monomolecular built-up film of monomolecular layers of a silane surfactant is described. In the process, the silane surfactant is chemically adsorbed on a hydrophilic surface of a substrate and is subjected to irradiation of a high energy beam or plasma treatment in an active gas atmosphere to activate the monomolecular layer. This activated layer is further adsorbed with the silane surfactant to form a built-up film. The beam irradiation or plasma treatment may be effected in a desired pattern. The beam irradiation or plasma treatment and the further adsorption are repeated until the desired number of the monomolecular layers is obtained.

Process for preparing a monomolecular built-up film

A method for the formation of monomolecular adsorption films of a silane compound having a diacetylene bond is described. The silane compound is chemically adsorbed on a substrate through .dbd.SiO-- bonds and the resultant film is significantly reduced in number of defects such as pinholes. When the monomolecular film is irradiated with actinic light, the diacetylene bonds are convered into a conjugated diacetylene polymer. Similarly, a built-up film of a desired number of monomolecular layers of a silane compound having an acetylene bond formed on a substrate by chemical adsorption and a corresponding number of monomolecular layers of an aliphatic acid or alcohol having an acetylene bond and alternately deposited on the first-mentioned layer is also provided.

Method for the formation of monomolecular adsorption films or built-up

A terminal perfluoroalkylsilane compound F(CF.sub.2).sub.m (CH.sub.2).sub.n Si(CH.sub.3).sub.p X.sub.3-p (m+n=10 to 32 carbon atoms in fluoroalkyl group) is prepared by a hydrosilylation reaction of a terminal perfluoroalkene compounds F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 (1+q+2=n) with the hydrodiensilane HSi(CH.sub.3).sub.p X.sup.3.sub.3-p. The F(CF.sub.2).sub.m (CH.sub.2).sub.1+q CH.dbd.CH.sub.2 are synthesized by a Grignard's reaction of a Grignard's reagent X.sup.2 Mg(CH.sub.2).sub.q CH.dbd.CH.sub.2 obtained from a terminal alkenyl halogen compound X.sup.2 (CH.sub.2).sub.q CH.dbd.CH.sub.2 with a terminal fluoroalkyl halogen compound F(CF.sub.2).sub.m (CH.sub.2).sub.1 X.sup.1. The terminal perfluoroalkylsilane compound has a sufficient lubricating effect and is useful for a coating agent with long and continuous lubricity.

Terminal perfluoroalkylsilane compounds

Disclosed in a method for producing polydiacetylene of superhigh molecular weight (i.e., a superlong conjugated polymer) having continuous conjugated bands and a straight chain by spreading an organic solvent containing diacetylene derivative on a water surface, gathering up by a barrier, and photopolymerizing the derivative while compressing at a constant surface pressure. Also disclosed is a method for producing polydiacetylene comprising the step of improving the arrangement by applying a direct-current field in a specified direction at the time of spreading and collecting the diacetylene derivative molecules.

Method for producing superlong conjugated diacetylene polymer

A responsive film containing a responsible group occuring a chemical reaction by energy beam is formed on an insulated substrate, and energy beam is irradiated in a pattern, and part of the responsive group is selectively deactivated or activated, and only the remaining portion of the responsive group of the responsive film is coupled with a chemical substance containing metal in a later process, and an ultrafine pattern of metal film is formed.

Method for producing ultrathin metal film and ultrathin-thin metal

This invention relates to a manufacturing method for a recording medium or a recording head characterized in improving the slide ability of a surface of a recording medium or a recording head, and improvement or their durability by forming a monomolecular film made from silane surfactants on the surface of a recording medium or a head by direct or indirect chemisorption.

Manufacturing method for a recording medium or a recording head

The present invention relates to an electric material, and particularly it relates to an organic substance having a polyacetylene linkage which exhibits electrical conductivity and nonlinear optical effect. More particularly, the present invention provides a process for producing an organic substance having a polyacetylene linkage which can be utilized, for example, as an electric material, said process comprising immersing a substrate having a hydrophilic surface in a solution of a substance containing an acetylene (--C.tbd.C--) group and a chlorosilane (--SiCl.sub.3) group dissolved in a nonaqueous organic solvent, thereby subjecting the substance containing an acetylene group and a chlorosilane group to chemical adsorption on the surface of the substrate, subjecting said substance to polymerization reaction by the use of radiation such as X-rays, electron beams, .gamma.-rays, or the like, and thereby producing a polyacetylene.

Process for producing a polyacetylene

Disclosed is a recording medium which comprises a base body of the recording medium, a recording layer formed on the base body, and a protective layer formed on the recording layer for protecting the recording layer. The protection layer is made from a silane surface active agent containing fluorine atoms (e.g., CF.sub.3 --(CF.sub.2)m--(CH.sub.2)n--SiCl.sub.3 (m, n: integer) and the agent is polymerized with the recording layer. The recording medium may provide high density recording performance.

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Katano, Japan

Hideharu Tamura