Sumitomo Metal Mining Company, Ltd.

Hideharu Okami

Yoshiyuki Abe

Tokuyuki Nakayama

Akio Watanabe

Junji Iida

Mikio Uemura

Provided is an optical film (a composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing a film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, and is characterized in that the optical film comprises cesium, tungsten, and oxygen, in which a refractive index n and an extinction coefficient k of the optical film at each of 300 nm and wavelengths [400 nm, 600 nm, . . . , 2400 nm] specified at 200 nm intervals in a wavelength region from 400 nm to 2400 nm are set within a range between 'n-max' and “n-min” made by graphing the maximum value and the minimum value of the refractive index in a wavelength dispersion graph of optical constants shown in FIG.and within a range between “k-max” and “k-min” made by graphing the maximum value and the minimum value of the extinction coefficient in the above wavelength dispersion graph of optical constants.

Optical film, sputtering target, and method of producing optical film

Provided is an optical film (composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing an optical film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, characterized in that the optical film comprises cesium, tungsten, and oxygen, and a refractive index n and an extinction coefficient k of the optical film at each of wavelengths [300 nm, 350 nm, 400 nm, 450 nm, . . . , 1700 nm] specified at 50 nm intervals in a wavelength region from 300 nm to 1700 nm are set respectively within specified numerical ranges.

A treatment apparatus includes two can rolls provided on a transfer path through which a long resin film is transferred in a roll-to-roll manner in a vacuum chamber; and surface treatment means facing an outer circumference of each of the can rolls to treat a surface of the long resin film cooled by being wound around the outer circumference. The downstream can roll is provided with upper and lower two sets of feeding and sending systems, and one surface of the long resin film in contact with the outer circumference of the downstream can roll at a time when the long resin film travels through the lower one of the two sets of feeding and sending systems is opposite to the other surface of the resin film in contact with the outer circumference of the downstream can roll at a time when the resin film travels through the upper one.

Apparatus for processing long base material by roll-to-roll method and film forming apparatus using the same

Disclosed herein is a roll-to-roll long base material surface processing device capable of performing surface processing on a long base material with little occurrence of wrinkling in the long base material at low costs. The surface processing device includes: two can rolls that cool a long resin film transferred in a roll-to-roll manner in a vacuum chamber with a cooling medium circulated therein by wrapping the long resin film around outer circumferences thereof; and surface processing units typified by magnetron sputtering cathodes provided so as to face the outer circumferences of the two can rolls, wherein a second can roll of the two can rolls other than a most upstream first can roll has a gas release mechanism that releases a gas from the outer circumference.

Roll-to-roll surface treatment device, and film deposition method and film deposition device using same

[Object] Provided are an electrode substrate film in which a circuit pattern formed of a metal thin line is less visible even under highly bright illumination, and a laminate film applied to the same. [Solving Means] An electrode substrate film with a transparent substrateand a metal laminate thin line includes a metal absorption layerwith a film thickness of 20 nm to 30 nm inclusive as a first layer, and a metal layeras a second layer, counted from the transparent substrate side, the laminate thin line having a line width of 20 &#x3bc;m or less. Optical constants of the metal absorption layer in a visible wavelength range (400 to 780 nm) satisfy conditions that a refractive index is 2.0 to 2.2 and an extinction coefficient is 1.8 to 2.1 at a wavelength of 400 nm, the refractive index is 2.4 to 2.7 and the extinction coefficient is 1.9 to 2.3 at a wavelength of 500 nm, the refractive index is 2.8 to 3.2 and the extinction coefficient is 1.9 to 2.5 at a wavelength of 600 nm, the refractive index is 3.2 to 3.6 and the extinction coefficient is 1.7 to 2.5 at a wavelength of 700 nm, and the refractive index is 3.5 to 3.8 and the extinction coefficient is 1.5 to 2.4 at a wavelength of 780 nm. An average reflectance in the visible wavelength range attributed to reflection at an interface between the transparent substrate and the metal absorption layer is 20% or less, and a difference between a highest reflectance and a lowest reflectance in the visible wavelength range is 10% or less.

Laminate film and electrode substrate film, and method of manufacturing the same

[Object] Provided are a laminate film and an electrode substrate film with excellent etching quality, in which a circuit pattern formed by etching processing is less visible under highly bright illumination, and a method of manufacturing the same. [Solving Means] A laminate film includes a transparent substrateformed of a resin film and a layered film provided on at least one surface of the transparent substrate. The layered film includes metal absorption layersandas a first layer and metal layers (), () as a second layer, counted from the transparent substrate side. The metal absorption layers are formed by a reactive sputtering method which uses a metal target made of Ni alone or an alloy containing two or more elements selected from Ni, Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, and Cu, and a reactive gas containing oxygen. The reactive gas contains hydrogen.

[Object] Provided are an electrode substrate film which does not cause trouble in a process to create a circuit pattern formed of a metal thin line and in which the circuit pattern is less visible even under highly bright illumination, and a method of manufacturing the same. [Solving Means] An electrode substrate film with a transparent substrateand a metal laminate thin line includes a metal absorption layerwith a film thickness of 20 nm to 30 nm inclusive as a first layer, and a metal layeras a second layer, counted from the transparent substrate side. Optical constants of the metal absorption layer in a visible wavelength range (400 to 780 nm) satisfy conditions that a refractive index is 1.8 to 2.2 and an extinction coefficient is 1.8 to 2.4 at a wavelength of 400 nm, the refractive index is 2.2 to 2.7 and the extinction coefficient is 1.9 to 2.8 at a wavelength of 500 nm, the refractive index is 2.5 to 3.2 and the extinction coefficient is 1.9 to 3.1 at a wavelength of 600 nm, the refractive index is 2.7 to 3.6 and the extinction coefficient is 1.7 to 3.3 at a wavelength of 700 nm, and the refractive index is 3.1 to 3.8 and the extinction coefficient is 1.5 to 3.4 at a wavelength of 780 nm. The highest reflectance in the visible wavelength range attributed to reflection at an interface between the transparent substrate and the metal absorption layer is 40% or less.

Electrode substrate film and method of manufacturing the same

In an absorption type multi-layer film ND filter having a thin substrate and provided thereon first and second absorption type multi-layer films which attenuate transmitted light, the first and second absorption type multi-layer films are constituted of multi-layer films each consisting essentially of dielectric layers formed of SiO, AlOor a mixture of these and metal film layers formed of Ni alone or an Ni alloy; the layers being alternately layered on the substrate; and the first and second absorption type multi-layer films are so formed on one side and the other side, respectively, of the substrate as to have a film structure in which they are symmetrical to each other interposing the substrate between them, and the warpage of the substrate has been controlled at a curvature of radius of 500 mm or more.

Absorption type multi-layer film ND filter

An absorption type multi-layer film ND filter having a substrate formed of a resin film and on at least one side thereof an absorption type multi-layer film of oxide dielectric film layers and absorption film layers which are alternately wherein the oxide dielectric film layers are each a SiCyOx (0&#x3c;y&#x2266;0.1, 1.5&#x3c;x&#x3c;2) film having an extinction coefficient at a wavelength of 550 nm of 0.005 to 0.05, formed by a physical vapor deposition process using a film-forming material composed chiefly of SiC and Si, and the absorption film layers are each a metal film having a refractive index at a wavelength of 550 nm of 1.5 to 3.0 and an extinction coefficient at that wavelength of 1.5 to 4.0, formed by a physical vapor deposition process; an outermost layer of the multi-layer film being one oxide dielectric film layer of SiCyOx.

Absorption type multi-layer film ND filter and process for producing the same

A bidirectional optical module having a devicefor emitting transmitting signal light, an optical fiberwhich the transmitting signal light from the device enters, a light-receiving devicewhich light from the optical fiber enters, and a wavelength splitting filter. The transmitting signal light emitted from the device is sent forward through the optical fiber, and the receiving signal light is received through the optical fiber. The bidirectional optical module has an optical device (optical isolator) of a reflection polarizerbonded to an end face of the optical fiber, a Faraday rotatordisposed integrally on the reflection polarizer and an absorption polarizerdisposed on an optical path extending between the device and the filter. The reflection polarizer has a wavelength dependency which functions as a polarizer for the transmitting signal light, but does not function as a polarizer for the receiving signal light.

Bidirectional optical module

An absorption type multi-layer film ND filter having a substrate and an optical multi-layer member consisting essentially of metal layers each composed chiefly of nickel (Ni) and dielectric layers each formed of any one of SiO, AlOand a mixture of these; the layers being alternately layered on the substrate. An Ni type metallic material having a small wavelength dependence of transmittance in the visible spectral range is used in the metal layers serving as light attenuation layers, and this enables materialization of an ND filter which can attain transmittance attenuation that is flat for wavelengths.

Growing community of inventors

Niihama, Japan

Hideharu Okami