Matsushita Electric Industrial Co., Ltd.

Hideaki Yasui

Hiroyoshi Tanaka

Ryuichi Murai

Yoshiki Sasaki

Kazuhiko Sugimoto

Akira Shiokawa

Keisuke Sumida

Shinya Fujiwara

Hideki Marunaka

Masaki Aoki

Junichi Hibino

Shigeo Suzuki

Hiroyosi Tanaka

Masatoshi Kudoh

Kazunori Hirao

Koichi Kotera

Nobuaki Nagao

Mitsuhiro Ohtani

Yuusuke Takada

Hiroyuki Yonehara

Masafumi Ookawa

Nobuyuki Kirihara

Katuyoshi Yamashita

Kinzou Nonomura

Kazuo Ootani

Choujurou Yamamitsu

Hidetaka Hiagshino

Hidetaka Higashino

Kinzo Nonomura

Hideki Asida

Tadashi Nakagawa

Takashi Hirao

Yuuji Mukai

An electrode plate, a method of manufacturing the same, a gas discharge panel using an electrode plate, and a method of manufacturing the same are provided by incorporating a relatively simple structure, which can keep electrodes formed on a plate from peeling or becoming misaligned. In the electrode plate, at least one electrode is formed and adhered to a main surface of a plate by a thick film or thin film formation method, wherein of all ends of the electrode, at least an end opposite to an end at a power supply point is adhered to the main surface of the plate with stronger adhesion than the other parts of the electrode. When this electrode plate is used as a front panel glass having a plurality of pairs of display electrodes in a gas discharge panel, at least an end of each bus line opposite to an end at a power supply point is firmly adhered to the surface of the front panel glass, thereby keeping the bus lines formed on respective transparent electrodes from warping and peeling away or becoming misaligned. Such a gas discharge panel can deliver excellent display performance.

Electrode plate and manufacturing method for the same, and gas discharge panel having electrode plate and manufacturing method for the same

A manufacturing method for a metal electrode used for a bus electrode, a data electrode, and the like which make up a display panel including a PDP (Plasma Display Panel) by which, when these electrodes are patterned according to a photolithographic method, the edge curl phenomenon can be substantially controlled to the extent that the phenomenon is negligible. The manufacturing method of the invention therefore includes a dry step for drying the layers making up the metal electrode so that flows (F, F, and F) of the solvent occur from a region having a high absorbency of the solvent to a region having a lower absorbency of the solvent.

Multi-layered shaped electrode

Barrier ribsformed on a back substrate PAare brought into contact with a bonding paste layerhaving an even surface, applying a bonding agent Bd evenly to the tops of the barrier ribs. Furthermore, a gas discharge panel having a structure in which discharge mainly occurs at locations distanced from parts of the panel connected using the bonding agent Bd is realized.

Display panel and manufacturing method for the same including improved bonding agent application method

Method of manufacturing metal electrode

Display panel and manufacturing method for the same including bonding agent application method

A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO , MgO, TiO , Al O , and Cr O . The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

Plasma display panel suitable for high-quality display and production method

Plasma display panels of the prior art are prone to cross talk leading to unstable image. The present invention provides a gas discharge panel comprising a first panel substrate having first electrodes , a second panel substrate having second electrodes opposing the first panel substrate , a sealing portion provided between peripheries of the two substrates for forming a gas discharge space between the first and second panel substrates and division walls provided on the second panel substrate for dividing the gas discharge space , wherein ridges of the division walls are bonded onto the inner surface of the first panel substrate

Gas discharge panel and method for manufacturing the same

A PDP does not suffer from dielectric breakdown though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 &mgr;m layer of a metallic oxide, on whose surface OH groups exist, such as ZnO, ZrO , MgO, TiO , Al O , and Cr O . The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is then coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

Plasma display panels of the prior art are prone to cross talk leading to unstable image. The present invention provides a gas discharge panel comprising a first panel substrate having first electrodes , a second panel substrate having second electrodes opposing the first panel substrate , a sealing portion provided between peripheries of the two substrates for forming a gas discharge space between the first and second panel substrates and division walls provided on the second panel substrate for dividing the gas discharge space , wherein ridges of the division walls are bonded onto the inner surface of the first panel substrate 104 by a frit glass

Gaseous discharge panel and manufacturing method therefor

A PDP does not suffer from dielectric breakdown even though a dielectric layer is thin, with the problems of conventional PDPs, such as cracks appearing in the glass substrates during the production of the PDP being avoided. To do so, the surface of silver electrodes of the PDP is coated with a 0.1-10 .mu.m layer of a metallic oxide on whose surface OH groups exist, such as ZnO, ZrO.sub.2, MgO, TiO.sub.2, Al.sub.2 O.sub.3, and Cr.sub.2 O.sub.3. The metallic oxide layer is then coated with the dielectric layer. It is preferable to form the metallic oxide layer with the CVD method. The surface of a metallic electrode can be coated with a metallic oxide, which is than coated with a dielectric layer. The dielectric layer can be made of a metallic oxide with a vacuum process method or the plasma thermal spraying method. The dielectric layer formed on electrodes with the CVD method is remarkably thin and flawless. When the dielectric layer is formed with the vacuum process method or the plasma spraying method, warping and cracks conventionally caused by baking the dielectric layer are prevented. Here, borosilicate glass including 6.5% or less by weight of alkali can be used as the glass substrate.

Plasma display panel with metal oxide layer on electrode

A beam emitted from a light source including the characteristic wavelength of flown particles in a film forming system is interrupted by a beam chopper in a predetermined cycle, and is then divided into a probing beam and a reference beam by a beam divider. The probing beam passes through a particle flight area and is then injected into a photo detector through an optical filter, and a probing signal is outputted. A reference signal is obtained from the reference beam in the same manner. A data processor detects the phase and level of both signals, so that an absorbance, i.e., a film forming rate for the flown particles is estimated. The film forming rate is integrated with time so that a film thickness is estimated. Thus, the range of the applicable film forming rate is wide. In addition, it is possible to perform continuous monitoring with high precision also in an atmosphere where a large amount of light having the same wavelength as the characteristic wavelength of the flown particles is generated, as in sputtering systems.

In-process film thickness monitoring system

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Hirakata, Japan

Hideaki Yasui