Hitachi, Ltd.

Hideaki Taniguchi

Akira Sasano

Ryouji Oritsuki

Shinji Matsumoto

Katsuhiko Yarita

Hirofumi Suzuki

Sakae Someya

Ryuuzoh Nashimoto

Haruo Matsumaru

Kazuo Shirahashi

Yuka Matsukawa

Hideaki Yamamoto

Hirofumi Kunitou

There are disclosed various types of TFT active matrix liquid crystal display devices and method of fabrication thereof in which a pixel is divided into three parts, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is driven by a DC cancelling technique.

TFT active matrix liquid crystal display devices

Liquid crystal display device including thin film transistors having gate electrodes completely covering the semiconductor

TFT active matrix LCD devices employing two superposed conductive films having different dimensions for the scanning signal lines

There are disclosed various types of TFT active matrix liquid crystal display devices in which a pixel is divided into three parts, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is driven by a DC cancelling technique.

TFT active matrix liquid crystal display devices with two layer gate

An active matrix liquid crystal display device, with a plurality of thin-film transistors provided over a glass substrate each including an anodized oxide film of aluminum gate electrode, in which transparent pixel electrodes are formed in the same plane as the gate electrodes between the glass substrate and amorphous silicon islands over which source and drain electrodes are provided.

LCD device with TFTs in which pixel electrodes are formed in the same

An active matrix liquid crystal display device, with a plurality of thin-film transistors provided over a glass substrate each including an anodized oxide film of aluminum gate electrode, in which transparent pixel electrodes are formed in the same plane as the gate electrodes between the glass substrate and amorphous silicon islands over which source and drain electrodes are provided. In such a device structure, in which the spacing between the ITO and the gate electrode can be compacted while ensuring that there are no short-circuits effected between the ITO layer and gate electrode during the manufacture of the LCD device, the gate electrode and, therefore, also the plate (lower) electrode of the capacitor Cadd are first formed, followed by the formation of the AOF layer over the gate electrode and over the plate electrode of the capacitor, respectively. Subsequently, the ITO pixel electrode is formed on the same plane as that of the first conductive layer, corresponding to the gate electrode and plate electrode of capacitor Cadd, and is followed by the formation of a relatively thicker second insulating layer, for example, a nitride insulating layer, on the first insulating layer, namely, the anodized oxide film, and on the pixel electrode. In accordance with this scheme, furthermore, the first insulating layer is formed by anodizing the metal layer constituting the first conductive layer.

Method for making LCD device in which gate insulator of TFT is formed

There are disclosed various types of TFT active matrix liquid crystal display devices in which a pixel is divided into three, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is drived by a DC cancelling technique.

TFT active matrix liquid crystal display with gate lines having two

TFT active matrix liquid crystal display devices with a holding

Liquid crystal display device with TFTS in which pixel electrodes are

TFT active matrix liquid crystal display devices with plural TFTs in

An active matrix liquid crystal display device with a plurality of thin-film transistors each including a gate electrode, preferably made of an aluminum film formed over a glass substrate, and a gate insulator preferably made of an upper silicon nitride film and a lower anodized oxide film of the aluminum film. Dummy gate lines DGL are disposed outside the outermost scanning signal line GL, and dummy data lines DDL are disposed outside the outermost video signal line DL so as to prevent breakage of outermost signal lines.

Liquid crystal display device having peripheral dummy lines

Growing community of inventors

Mobara, Japan

Hideaki Taniguchi