Kabushiki Kaisha Toshiba

Hideaki Ikuma

Shoji Seta

Yukihito Oowaki

A semiconductor device has a semiconductor substrate which has a plurality of pad electrodes provided on a top surface thereof and has an approximately rectangular shape; a rewiring layer which is provided with a plurality of contact wiring lines connected to the plurality of pad electrodes, is disposed on the semiconductor substrate through an insulating film, and has an approximately rectangular shape; and a plurality of ball electrodes which are provided on the rewiring layer.

Semiconductor device

A semiconductor device has a semiconductor substrate which has a plurality of pad electrodes provided on a top surface thereof and has an approximately rectangular shape; a rewiring layer which is provided with a plurality of contact wiring lines connected to the plurality of pad electrodes, is disposed on the semiconductor substrate through an insulating film, and has an approximately rectangular shape; and a plurality of ball electrodes which are provided on the rewiring layer. A plurality of first pad electrodes among the plurality of pad electrodes are arranged on an outer circumference of the semiconductor substrate to be along a first side of the semiconductor substrate, a plurality of first ball electrodes among the plurality of ball electrodes are arranged on an outer circumference of the rewiring layer to be along the first side, and any one of the plurality of first ball electrodes is connected to the first pad electrode positioned below the corresponding ball electrode through the contact wiring lines, and the first pad electrodes are not disposed on the lower side of the first ball electrodes positioned at an end of the first side.

A semiconductor device has an LSI chip including a semiconductor substrate, an LSI core section provided at a center portion of the semiconductor substrate and serving as a multilayered wiring layer of the semiconductor substrate, a first rewiring layer provided adjacent to an outer periphery of the LSI core section on the semiconductor substrate and including a plurality of wiring layers, a first pad electrode disposed at an outer periphery of the first rewiring layer, and an insulation layer covering the first pad electrode. The semiconductor device includes a second rewiring layer provided on the LSI chip and including a rewiring connected to the first pad electrode. The semiconductor device includes a plurality of ball electrodes provided on the second rewiring layer. The first rewiring layer is electrically connected to the LSI core section and the first pad electrode.

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Kawasaki, Japan

Hideaki Ikuma