Ebara Corporation

Kabushiki Kaisha Toshiba

Hideaki Hayashi

Kazutoshi Nagai

Tohru Satake

Takanari Yasui

Hironori Sonobe

Toyohiko Takeda

Yoshio Hatada

Kazuhiko Kaneko

Yoshinobu Sawada

The present invention discloses an automatic semiconductor device classification system including a current measuring unit, a data memory, a processor connected to the data memory and the current measuring unit, and an output unit connected to the processor. Patterns of curves representing approximate I-V characteristics between predetermined electrodes of semiconductor devices are automatically determined and the approximate I-V characteristics are classified into predetermined categories. The data memory stores the discrete I-V relations, and further stores a first control voltage, a first threshold current value at the first control voltage, a second control voltage corresponding to the second control voltage. The processor includes an acquisition circuit, a comparison circuit and a classification circuit. In the acquisition circuit, the first decision current value at the first control voltage and the second decision current value at the second control voltage are obtained using the measured results. In the comparison circuit, the first decision current value is compared with the first threshold current value stored in the data memory and the second decision current value is compared with the second threshold current value stored in the data memory. In the classification circuit, the patterns of the curves representing the approximate I-V characteristics are determined and classification is performed.

Automatic semiconductor device classification system, method for classifying semiconductor device and recording medium having program for the system

An exhaust apparatus and a high vacuum pumping unit including such high vacuum device and an auxiliary vacuum pump are disclosed, wherein a high vacuum is achieved in a vacuum vessel such that the gas molecules within the vacuum vessel are ionized and accelerated to be exhausted and, further, in the high vacuum pumping unit, those gas molecules diffused back or desorbed from the vacuum pump are ionized and accelerated to be returned to the vacuum pump.

Exhaust apparatus and vacuum pumping unit including the exhaust apparatus

A secondary ion mass spectrometer analyzes secondary ions by separating and detecting positive and negative secondary ions generated from a sample when the sample is irradiated with a high speed primary beam. The sample is irradiated with a primary beam such as a high speed atom beam and secondary ions are emitted from the sample. The emitted secondary ions are separated and detected by a quadrupole mass spectrometer. Downstream of the quadrupole mass spectrometer, a plurality of metallic rod electrodes are provided parallel to each other, some of which are supplied with a positive voltage and the rest of which are supplied with a negative voltage. An electrostatic shield surrounds the metallic rod electrodes. The secondary ions are separated into positive and negative secondary ions by the electric fields formed by the metallic rod electrodes. The separated secondary ions are respectively converted into currents by corresponding secondary electron multipliers or Faraday cups.

Secondary ion mass spectrometer for analyzing positive and negative ions

An exhaust apparatus and a high vacuum pumping unit including a high vacuum device and an auxiliary vacuum pump are disclosed, wherein a high vacuum is achieved in a vacuum vessel such that the gas molecules within the vacuum vessel are ionized and accelerated to be exhausted. In the high vacuum pumping unit, those gas molecules are diffused back or released from the vacuum pump are ionized and accelerated to be returned to the vacuum pump.

Exhaust apparatus with vacuum pump

An ion neutralizer which neutralizes electric charges on ions and produces a fast atom beam in an ultra-high vacuum comprising: an ion source disposed in a vacuum container; a hollow container disposed in the vacuum container, the hollow container being closed at both ends thereof except for an ion beam entrance hole provided in one end portion thereof and a fast atom beam exit hole provided in the other end portion thereof; a metal vapor generating source comprising a filament wound with a fine wire or ribbon of a metal selected from titanium, magnesium and aluminum, the filament being disposed in the hollow container in such a manner as to surround an axis connecting the ion beam entrance hole and the fast atom beam exit hole; a vacuum pump connected to the vacuum container; and a filament heating power supply disposed outside the vacuum container and the hollow container and connected to the filament.

Growing community of inventors

Kanagawa, Japan

Hideaki Hayashi