Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Az Electronic Materials (japan) K.k.

Az Electronic Materials (korea) Ltd.

Samsung Displayco., Ltd.

Dongjin Semichem Co., Ltd.

Techno Semichem Co., Ltd.

Samyang Ems Co., Ltd.

Hi-Kuk Lee

Jung-In Park

Sang-Hyun Yun

Jeong-Min Park

Cha-Dong Kim

Ki-beom Lee

Jae-Hyuk Chang

Chang-Hoon Kim

Doo-Hee Jung

Woo-Seok Jeon

Su-Yeon Sim

Kab-Jong Seo

Hyun-Seok Kim

Jun-Ho Sim

Ki-Hyuk Koo

Hoon Jong Kang

Sang-Gab Kim

Sang-Hyun Lee

Jae-Sung Kim

Byung-Uk Kim

Hyoc-Min Youn

Sang-Don Jang

Deok-Man Kang

Jung-Chul Heo

Jae-young Choi

Jin-Ho Ju

Shi-Yul Kim

Yang-Ho Jung

Dong-Ki Lee

Sae-Tae Oh

Chong-Chul Chai

Min-Seok Oh

Dong-Min Kim

Seung-Ha Choi

Kyu-Young Kim

Soo-Wan Yoon

Jun-Hyung Souk

Soo-Jin Kim

Jae-Young Jang

Sang-Woo Whangbo

Min-Soo Lee

Won-Kie Chang

Sang-Woo Bae

Young-Min Kim

Jae-Ho Lee

Jang-Soo Kim

Bo-Sung Kim

Seung-Hwan Cho

Yong-Il Kim

Sang-Wook Park

Tae-Young Choi

Young-Soo Yoon

Sang-tae Kim

Joo-Ae Youn

Jong-cheol Kim

Woo-Yong Sung

Kwang-Soo Lee

Seon-Pil Jang

Joo-Han Kim

Yasuhiro Kameyama

Yuko Yako

Yeong-Beom Lee

Sang Hyun Yun

In-Bae Chang

Shi-Jin Sung

Tsunemitsu Torigoe

Yeon-Taek Jeong

Kyung-Su Mun

Sang-joon Hong

Pil-Soon Hong

Seung-Ki Kim

Seon-Su Sin

Oui-serg Kim

Joo-Pyo Yun

Ja-Hun Byeon

Youn-Suk Kim

Yuuji Mizuho

Se-Jin Choi

Hyoc-Min Yoon

Si-Young Jung

Sang-Gak Choi

Dong-ki Lee

Jae-Woong Mun

Mi-Sun Ryu

Yako Yuko

Ki-Sik Choi

Byoung-Min Yun

Sang-Hyn Lee

Eun-Sang Lee

Jong-Joo Kim

Sung-Yeol Jin

A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.

Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method

A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.

Maskless exposure method and a maskless exposure device for performing the exposure method

Disclosed is a fixing module for fixing an optical system to an optical apparatus, including a coupling unit having a plate to couple to the apparatus, the coupling unit having a first penetrating space at a central portion thereof and a protruding portion protruded downwards from the plate; a first fixing unit combinable with the coupling unit and having a receiving space including a thermosetting resin such that the protruding portion is fixed into the thermosetting resin; and a second fixing unit combinable with the first fixing unit and having a second penetrating space communicating with the first penetrating space, such that the optical system can penetrate through the first and the second penetrating spaces and be fixed by the second fixing unit.

Fixing module for fixing an optical system to an optical apparatus and an optical apparatus including the same

A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.

Maskless exposure device and method for compensating cumulative illumination using the same

A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Exposure apparatus and method thereof

A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

Maskless exposure device and maskless exposure method using the same

A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.

Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer

A stage device includes a stage configured to move in an X-axis direction and a Y-axis direction, an X-axis interference reflector spaced apart from the stage in the X-axis direction, a first X-axis interferometer disposed on the stage that is configured to measure an X-axis location of the stage using the X-axis interference reflector, and an optical movable element spaced apart from the stage in the Y-axis direction that is configured to shift in the X-axis direction a path of a light beam propagating in the Y-axis direction according to movement of the stage in the X-axis direction.

Stage device and driving method thereof

A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

Digital exposure apparatus and method of exposing a substrate using the same

Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.

Photoresist composition and method of forming a color filter using the same

An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.

Exposure apparatus including light blocking member with light condensing part

A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.

Photoresist composition and method of forming a black matrix using the same

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Yongin-si, South Korea

Hi-Kuk Lee