Chinese Academy of Sciences

Heshig Bayan

Wenhao Li

Zhaowu Liu

Wei Wang

Shan Jiang

Yanxiu Jiang

Yubo Li

Shuo Li

A method and a device for compensating a surface error of a holographic grating substrate based on scanning and exposure technology relates to a technical field of grating development. The method and the device adopt surface error compensation technology based on phase modulation of interference fringes of a scanning beam interference lithography system. The method and the device solve a poor grating diffraction wavefront quality caused by a surface processing error in a field of holographic grating research and improves full-aperture diffraction wavefront quality of a grating. Through coordination between feedback of the displacement measurement apparatus for the position of the two-dimensional worktop and the modulation of the scanning beam interference lithography system, full-aperture compensation of the surface error of the holographic grating substrate is achieved, which not only reduces processing accuracy requirements for the holographic grating substrate, but also improves the full-aperture diffraction wavefront quality of the grating.

Method and device for compensating surface error of holographic grating substrate

Growing community of inventors

CHANGCHUN, China

Heshig Bayan